PbS thin films with thickness between 100 and 150 nm were grown for the first time by microwave-assisted chemical bath deposition in a commercial automated system with deposition times not exceeding 5 min. X-ray diffraction analysis shows that the thin films have cubic rock salt type structure with good crystallinity. The grain size increased from 18 to 20 nm, as the deposition time increased. Energy dispersive X-ray results confirm that the films are stoichiometric. Optical measurements show that thin films have relatively high absorption coefficients between 104 and 105 cm-1 in the visible range. In addition, the films exhibit a direct gap, within the energy range from 1.0 to 1.35 eV. The electrical properties, such as conductivity, the Seebeck coefficient, carrier concentration, and carrier mobility, are discussed.

中文翻译：

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沉积时间对微波辅助化学浴沉积获得的 PbS 薄膜光电性能的影响

厚度在 100 到 150 nm 之间的 PbS 薄膜首次通过微波辅助化学浴沉积在商业自动化系统中生长，沉积时间不超过 5 分钟。X射线衍射分析表明，薄膜具有立方岩盐型结构，结晶度好。随着沉积时间的增加，晶粒尺寸从 18 nm 增加到 20 nm。能量色散 X 射线结果证实薄膜是化学计量的。光学测量表明，薄膜在可见光范围内在 104 到 105 cm-1 之间具有相对较高的吸收系数。此外，薄膜在 1.0 到 1.35 eV 的能量范围内表现出直接间隙。讨论了电学特性，例如电导率、塞贝克系数、载流子浓度和载流子迁移率。