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Effect of substituents in 5-R-3-amino-1,2,4-triazoles on the chemisorption on copper surface in neutral media
Corrosion Engineering, Science and Technology ( IF 1.5 ) Pub Date : 2020-08-18
Yuri I. Kuznetsov, Khidmet S. Shikhaliev, Marina O. Agafonkina, Nina P. Andreeva, Ivan A. Arkhipushkin, Andrei Yu. Potapov, Leonid P. Kazansky

Using a complex of physical and electrochemical methods, the effect of R-substituent on the adsorption of 5-R-3-amino-1,2,4-triazoles on copper surface in neutral buffer solution was studied. Minimum concentrations C min, which suppresses the first anodic peak of copper dissolution were found, and two different linear correlations of log C min values on induction constant σI were plotted: for compounds with electron-donor and electron-withdrawing ones. Using ellipsometry, free adsorption energies −ΔG 0 а,max were determined. It was shown that adsorption of triazoles with electron acceptor R, which have the highest σI, occurs at very low concentrations and −ΔG 0 а,max = 96.6 kJ mol−1 that is higher than for inhibitors of the same reaction series, but with electron-donor R (70 ÷ 85 kJ mol−1). In this case, monolayers are formed, whose thicknesses are close to molecule size. The formation of chemisorption bonds is confirmed using XPS by studying the composition of adsorption layers formed by 5-CF3-3-amino-1,2,4-triazole on the copper surface.



中文翻译:

5-R-3-氨基-1,2,4-三唑中取代基对中性介质中铜表面化学吸附的影响

使用复杂的物理和电化学方法,研究了中性缓冲溶液中R取代基对5-R-3-氨基-1,2,4-三唑在铜表面吸附的影响。最小浓度Ç 分钟,这抑制铜溶解的第一阳极峰被发现了,和日志的两个不同的线性关系Ç 分钟上感应的恒定值σ作图:用于与电子给体和吸电子那些化合物。使用椭圆光度法,免费吸附能-Δ ģ 0 а,最大值进行了测定。结果表明,与电子受体- [R三唑,它具有最高的σ的吸附,发生在非常低的浓度和-ΔG 0 ,max = 96.6 kJ mol -1,高于相同反应系列的抑制剂,但具有电子给体R(70÷85 kJ mol -1)。在这种情况下,形成单层,其厚度接近分子大小。使用XPS通过研究由铜表面上的5-CF 3 -3-氨基-1,2,4-三唑形成的吸附层的组成,证实了化学吸附键的形成。

更新日期:2020-08-18
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