Using a complex of physical and electrochemical methods, the effect of R-substituent on the adsorption of 5-R-3-amino-1,2,4-triazoles on copper surface in neutral buffer solution was studied. Minimum concentrations C _min, which suppresses the first anodic peak of copper dissolution were found, and two different linear correlations of log C _min values on induction constant σ_I were plotted: for compounds with electron-donor and electron-withdrawing ones. Using ellipsometry, free adsorption energies −ΔG ⁰ _а,max were determined. It was shown that adsorption of triazoles with electron acceptor R, which have the highest σ_I, occurs at very low concentrations and −ΔG ⁰ _а,max = 96.6 kJ mol⁻¹ that is higher than for inhibitors of the same reaction series, but with electron-donor R (70 ÷ 85 kJ mol⁻¹). In this case, monolayers are formed, whose thicknesses are close to molecule size. The formation of chemisorption bonds is confirmed using XPS by studying the composition of adsorption layers formed by 5-CF₃-3-amino-1,2,4-triazole on the copper surface.

使用复杂的物理和电化学方法，研究了中性缓冲溶液中R取代基对5-R-3-氨基-1,2,4-三唑在铜表面吸附的影响。最小浓度Ç _分钟，这抑制铜溶解的第一阳极峰被发现了，和日志的两个不同的线性关系Ç _分钟上感应的恒定值σ_我作图：用于与电子给体和吸电子那些化合物。使用椭圆光度法，免费吸附能-Δ ģ ⁰ _{а，最大值}进行了测定。结果表明，与电子受体- [R三唑，它具有最高的σ的吸附_我，发生在非常低的浓度和-ΔG ⁰ _，max = 96.6 kJ mol ^-1，高于相同反应系列的抑制剂，但具有电子给体R（70÷85 kJ mol ^-1）。在这种情况下，形成单层，其厚度接近分子大小。使用XPS通过研究由铜表面上的5-CF ₃ -3-氨基-1,2,4-三唑形成的吸附层的组成，证实了化学吸附键的形成。