Abstract Ti and TiN thin films were deposited by means of electron beam evaporation on stainless steel substrates, and subsequently annealed at different temperatures (650, 750 and 850 °C) in a nitrogen atmosphere. The surface morphology of the films studied by atomic force microscopy (AFM), was found to exhibit specific multifractal properties depending on the annealing temperature. It turned out that the width of the multifractal singularity spectra, f(α), decreased as the annealing temperature increased up to 750 °C, but it increased when the temperature was kept at 750 and 850 °C accompanied by the rapid development of the surface objects. The generalized fractal dimension followed a similar trend. On the other hand, the corrosion resistance of the specimens was studied bythe potentiodynamic polarization test in 3.5% NaCl solution at room temperature, observing improved corrosion protection of the films remarkably due to the presence of very thin titanium nitride outer layer.

中文翻译：

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退火对Ti/SS薄膜微观形貌和腐蚀性能的影响

摘要 Ti 和TiN 薄膜通过电子束蒸发沉积在不锈钢基体上，然后在不同温度（650、750 和850 °C）下在氮气气氛中退火。发现通过原子力显微镜 (AFM) 研究的薄膜的表面形态根据退火温度表现出特定的多重分形特性。结果表明，随着退火温度升高到 750 °C，多重分形奇异谱的宽度 f(α) 减小，但当温度保持在 750 和 850 °C 时，随着退火温度的快速发展而增加。表面对象。广义分形维数也遵循类似的趋势。另一方面，通过动电位极化试验研究了试样的耐腐蚀性能3。