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Effect of interlayer on resistive switching properties of SnO2-based memristor for synaptic application
Results in Physics ( IF 4.4 ) Pub Date : 2020-08-13 , DOI: 10.1016/j.rinp.2020.103325
Mehr Khalid Rahmani , Muhammad Ismail , Chandreswar Mahata , Sungjun Kim

Memristor device opens a new pathway for artificial synapses in the neuromorphic system. In this work, we demonstrate the enhanced memristive and synaptic charactersitcs in SnO2-based memristor device with a thin amorphous zinc tin oxide (α-ZTO) film and TiON interlayer that is confirmed by X-ray photoelectron spectroscopy (XPS) analysis. A more linear and symmetric long-term potentiation (LTP) and long-term depression (LTD) with lower power consumption are achieved through resistance change induced by repetitive pulse inputs in the double n-type SnO2/ZTO semiconductor device. Moreover, the transition from short-term memory (STM) to long-term memory (LTM) under repetitive identical pulse inputs is demonstrated. The oxygen vacancy-based switching mechanism model and energy band diagram is proposed for W/SnO2/ZTO/TiN memristor device. Experimental results show that W/SnO2/ZTO/TiN memristor as a artificial synapses could be of great benefit for hardware neuromorphic computing.



中文翻译:

中间层对基于SnO 2的忆阻器忆阻开关特性的影响

忆阻器设备为神经形态系统中的人工突触开辟了一条新途径。在这项工作中,我们证明了具有薄非晶锌氧化锡(α-ZTO)膜和TiON夹层的SnO 2基忆阻器器件具有增强的忆阻和突触特性,这已通过X射线光电子能谱(XPS)分析得到了证实。通过双n型SnO 2中重复脉冲输入引起的电阻变化,实现了线性度更高,对称性更强的长期增强(LTP)和长期降低(LTD)的功耗。/ ZTO半导体器件。此外,还演示了在重复的相同脉冲输入下从短期记忆(STM)过渡到长期记忆(LTM)的过程。针对W / SnO 2 / ZTO / TiN忆阻器器件,提出了基于氧空位的开关机制模型和能带图。实验结果表明,W / SnO 2 / ZTO / TiN忆阻器作为人工突触可能对硬件神经形态计算有很大的帮助。

更新日期:2020-08-13
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