In this study, the structure, adhesion, and cell viability characteristics of silicon-incorporated diamond-like carbon (Si-DLC) coatings on fused silica substrates were investigated. The effects of argon and oxygen postprocessing plasma treatments on the Si-DLC coatings were also studied. The contact angle results showed that the Si-DLC coatings were more hydrophilic than the uncoated surfaces, and postprocessing plasma treatment increased the hydrophilicity of the Si-DLC coatings. Atomic force microscopy and profilometry confirmed that postprocessing plasma treatment increased the thickness and roughness of the Si-DLC coatings. The results of microscratch testing indicated that the plasma treatments reduced the adhesion of the coatings. The x-ray photoelectron spectroscopy (XPS) showed the presence of carbon, oxygen, and silicon in the Si-DLC coatings before and after the plasma treatments. These results show that the postprocessing plasma treatment significantly reduced the atomic percentage of the carbon in the Si-DLC coatings. XPS also confirmed the presence of carbon in the form of sp³(C—C), sp²(C=C), C—O, and C=O bonds in the Si-DLC coatings; it showed that postprocessing treatments significantly increased the percentage of oxygen in the Si-DLC coatings. Fourier transform infrared spectroscopy (FTIR) analysis showed features associated with C—OH stretching, C—H bending, as well as Si—CH₂ and C—H bending in the Si-DLC coating. The XPS and FTIR results confirmed that the plasma treatment caused dissociation of the sp² and sp³ bonds and formation of C—OH bonds. The contact angle data indicated that postprocessing treatment increased the hydrophilicity of the Si-DLC coating. Similar to the uncoated substrates, L929 cells showed no change in cell viability when cultured on Si-DLC coatings. These results of the study indicate the suitability of Si-DLC coatings as inert coatings for medical and biotechnology applications.

中文翻译：

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氩气和氧等离子体处理增加了亲水性并降低了掺硅类金刚石涂层的附着力。

在这项研究中，研究了熔融石英基材上掺硅类金刚石碳 (Si-DLC) 涂层的结构、粘附和细胞活力特性。还研究了氩气和氧气后处理等离子体处理对 Si-DLC 涂层的影响。接触角结果表明，Si-DLC涂层比未涂层表面更具亲水性，后处理等离子体处理增加了Si-DLC涂层的亲水性。原子力显微镜和轮廓测定法证实后处理等离子体处理增加了 Si-DLC 涂层的厚度和粗糙度。微划痕测试的结果表明，等离子体处理降低了涂层的附着力。X 射线光电子能谱 (XPS) 显示存在碳、氧、等离子处理前后的 Si-DLC 涂层中的硅。这些结果表明后处理等离子体处理显着降低了 Si-DLC 涂层中碳的原子百分比。XPS 还证实了碳以 sp 的形式存在Si-DLC涂层中的³ (C-C)、sp ² (C=C)、C-O和C=O键；结果表明，后处理显着增加了 Si-DLC 涂层中氧的百分比。傅里叶变换红外光谱 (FTIR) 分析显示了与 Si-DLC 涂层中的C-OH 拉伸、C-H 弯曲以及 Si-CH ₂和 C-H 弯曲相关的特征。XPS 和 FTIR 结果证实等离子体处理导致 sp ²和 sp ³解离键和 C-OH 键的形成。接触角数据表明后处理增加了 Si-DLC 涂层的亲水性。与未涂覆的基材类似，L929 细胞在 Si-DLC 涂层上培养时细胞活力没有变化。这些研究结果表明 Si-DLC 涂层作为惰性涂层适用于医疗和生物技术应用。