Nitrogen trifluoride (NF 3 ) is an important molecule in the field of plasma science as an efficient fluorine source in manufacturing very large scale integrated circuits. The dynamic parameters of NF 3 , especially its total dissociation cross sections, are extremely important for improving the accuracy of plasma models. However, very few dissociation cross section data exist in experiment. In the present work, the generalized oscillator strengths of the dissociative excited states of NF 3 have been determined at an incident electron energy of 1500 eV and an energy resolution of 70 meV. The corresponding optical oscillator strengths have been obtained by extrapolating the generalized oscillator strengths to the limit of zero squared momentum transfer. The total dissociation cross sections of the dissociative excited states of NF 3 have been obtained systematically from the threshold to 2500 eV with the aid of the BE-scaling method, which gi...

中文翻译：

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等离子体相关的三氟化氮快速电子碰撞研究

三氟化氮（NF 3）是等离子体科学领域中的重要分子，是制造超大规模集成电路的有效氟源。NF 3的动力学参数，尤其是其总解离截面，对于提高等离子体模型的准确性非常重要。但是，实验中几乎没有解离截面数据。在目前的工作中，在入射电子能量为1500 eV，能量分辨率为70 meV的情况下，确定了NF 3的解离激发态的广义振荡器强度。通过将广义振荡器强度外推到零平方动量传递的极限，可以获得相应的光学振荡器强度。