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Creation of surface nanometer-scale plasma region by irradiation with slow highly charged ions
Physica Scripta ( IF 2.9 ) Pub Date : 2020-08-06 , DOI: 10.1088/1402-4896/aba865
S A Morsi 1 , W M Moslem 1, 2 , A S El-Said 3 , H Bahlouli 3
Affiliation  

Slow highly charged ions (HCIs) were used to create a plasma region of nanometer scale on the surface of different materials. The creation of the plasma in a localized region is accompanied by the formation of surface nanostructures. The plasma expansion approach is used to explain the creation mechanism of HCI-induced nanostructures in lithium niobate single crystals, considering the Maxwellian and non-Maxwellian electron distributions. The numerical solutions of the applied hydrodynamic equations show that the profile of the early stage expanded plasma is independent of the ratio of ion-to-electron temperatures. However, an increase in the temperature ratio leads to a wider expansion domain. In addition, the effect of material constituents ions are studied in terms of the modifications induced in the plasma-expanded region.

中文翻译:

通过缓慢的高电荷离子辐照产生表面纳米级等离子体区域

缓慢的高电荷离子(HCI)用于在不同材料的表面上创建纳米级的等离子体区域。在局部区域中等离子体的产生伴随着表面纳米结构的形成。考虑到麦克斯韦和非麦克斯韦电子分布,等离子膨胀法被用来解释HCl诱导的铌酸锂单晶中纳米结构的形成机理。所应用的流体动力学方程的数值解表明,早期膨胀等离子体的轮廓与离子电子温度比无关。然而,温度比的增加导致更宽的膨胀域。另外,根据在等离子体扩展区域中引起的修饰来研究材料成分离子的作用。
更新日期:2020-08-10
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