This work deals with the preparation and characterization of pure and Nickel-doped porous Tin oxide (SnO 2 ) thin films, using Spray pyrolysis technique for an eventual application in optoelectronics. The structural, morphological, optical, and electrical properties of these prepared samples were investigated using various techniques. X-ray diffraction analysis confirmed the tetragonal structure of pure SnO 2 and Ni-doped films. The preferred orientation of the crystallites changed from (110) to (200) with the film doped at 15.3 at.% Ni, with crystallite size of about 10 and 18 nm for 15.3 at.% Ni-doped and 5.6 at.% Ni-doped SnO 2 , respectively. Scanning Electron Microscopy shows that the 15.3 at.% Ni-doped SnO 2 film surface is relatively homogeneous, while the 5.6 at.% Ni-doped film is highly porous. The measured contact angles are less than 90° for all the prepared samples confirming the hydrophilic character of all the films. Transmitta...

中文翻译：

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喷雾热解制备亲水镍掺杂多孔SnO 2薄膜

这项工作涉及使用喷雾热解技术最终应用于光电子领域的纯镍掺杂多孔氧化锡（SnO 2）薄膜的制备和表征。使用各种技术研究了这些制备的样品的结构，形态，光学和电学性质。X射线衍射分析证实了纯SnO 2和掺Ni膜的四方结构。微晶的优选取向从（110）改变为（200），其中膜以15.3at。％的Ni掺杂，微晶尺寸为15.3at。％的Ni和5.6at。％的Ni-约10和18nm。分别掺杂SnO 2。扫描电子显微镜表明，15.3at。％的Ni掺杂的SnO 2膜表面是相对均匀的，而5.6at。％的Ni掺杂的膜是高度多孔的。对于所有制备的样品，测得的接触角均小于90°，​​证实了所有膜的亲水性。传输...