Abstract A study on the physical, chemical and electrochemical (properties) behavior of bismuth oxide thin films is presented in this work. Thin films were grown on 316 L stainless steel substrates via Unbalanced Magnetron Sputtering (UMS) in reactive phase, varying the DC power applied to the target between 20 and 80 W with 10 W step, keeping the gases flow constant at 9 sccm and the Ar/O2 ratio at 80:20. X-ray diffraction analysis was carried out for the structural characterization, showing that the crystallinity of the films strongly depends on the power of the discharge. The elemental chemical composition was determined using the Rutherford Backscattering (RBS) technique, making it possible to observe that the films were composed by a mixture of crystalline bismuth and possibly amorphous bismuth oxide. With this technique, the thickness of the coatings was measured, observing that this parameter increased from 200 to 700 nm as power values increased. Finally, the electrochemical analysis showed that corrosive behavior depends on the sample growth conditions and coatings thickness.

中文翻译：

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通过不平衡磁控溅射生长氧化铋薄膜的结构、化学和电化学研究

摘要 这项工作介绍了氧化铋薄膜的物理、化学和电化学（性质）行为。在反应阶段通过不平衡磁控溅射 (UMS) 在 316 L 不锈钢基板上生长薄膜，以 10 W 步长在 20 到 80 W 之间改变施加到目标的直流功率，保持气体流量恒定在 9 sccm，Ar /O2 比率为 80:20。对结构表征进行了 X 射线衍射分析，表明薄膜的结晶度强烈依赖于放电功率。元素化学成分是使用卢瑟福背散射 (RBS) 技术确定的，因此可以观察到薄膜由结晶铋和可能的无定形氧化铋的混合物组成。有了这个技术，测量涂层的厚度，观察到随着功率值的增加，该参数从 200 nm 增加到 700 nm。最后，电化学分析表明腐蚀行为取决于样品生长条件和涂层厚度。