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Preparation of ZnO nanosheet-assembly film on zinc plate by cold plasma
Thin Solid Films ( IF 2.0 ) Pub Date : 2020-10-01 , DOI: 10.1016/j.tsf.2020.138274
Wei Zhang , Changlin Li , Zunyi Tian , Yanfang Wang , Zhongyu Hou

Abstract We report a facile method for preparing ZnO nanosheet-assembly film by cold plasma. The cold plasma is generated on zinc plate by indoor air dielectric barrier discharge. After 240 seconds discharge and drying, a film of Zn5(OH)8(NO3)2 · 2H2O nanosheets form on the zinc plate. ZnO nanosheet-assembly film is then obtained by calcining the Zn5(OH)8(NO3)2 · 2H2O film at 250 ∘C for 1 h. ZnO nanosheets are composed of single-crystal nanoparticles with size of 30–50 nm and abundant large mesopores. The porous ZnO nanosheet-assembly film with a band gap of 3.24 eV absorbs 90% of the ultraviolet light (in range from 300 to 370 nm) and 65% of the visible light. The film deposition rate by this method is as high as 0.36 µm s − 1 .

中文翻译:

冷等离子体在锌板上制备ZnO纳米片组装膜

摘要 我们报告了一种通过冷等离子体制备 ZnO 纳米片组装膜的简便方法。通过室内空气介质阻挡放电在锌板上产生冷等离子体。经过240秒的放电和干燥,在锌板上形成一层Zn5(OH)8(NO3)2·2H2O纳米片。然后通过在 250 ∘C 下煅烧 Zn5(OH)8(NO3)2·2H2O 薄膜 1 小时获得 ZnO 纳米片组装薄膜。ZnO 纳米片由大小为 30-50 nm 的单晶纳米粒子和丰富的大介孔组成。带隙为 3.24 eV 的多孔 ZnO 纳米片组装膜吸收了 90% 的紫外光(范围为 300 至 370 nm)和 65% 的可见光。该方法的成膜速度高达0.36 μm s - 1 。
更新日期:2020-10-01
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