Abstract The nanostructured titanium oxynitride (TiOxNy) thin film was fabricated by a reactive direct current magnetron sputtering method at room temperature. The mechanism of TiOxNy thin film formation depended on the proportion of oxygen and nitrogen gases and their ionization energies. The influence of nitrogen and oxygen gases on microstructural, morphological, and optical properties of nanostructured TiOxNy thin film was investigated by X-ray diffraction, X-ray photoelectron spectroscopy, field emission scanning electron microscope, and ultraviolet-visible spectrophotometer, respectively. The crystalline TiOxNy phase formed when depositing at the O2 flow rate of 0.1 sccm whereas the amorphous TiOxNy phase formed when depositing at the O2 flow rate of 0.2 – 0.4 sccm. In addition, the amorphous TiOxNy phase changed to the titanium dioxide phase when the O2 flow rate was higher than 0.4 sccm. The cross-sectional microstructure and surface morphology of nanostructured TiOxNy thin film exhibited a poorly columnar structure and very smooth surface. The optical bandgap of TiOxNy thin films increased from 1.72 to 3.41 eV when the O2 flow rate was in the range of 0.1 to 1.0 sccm.

中文翻译：

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室温溅射氮氧化钛薄膜：氧添加的影响

摘要 采用反应性直流磁控溅射法在室温下制备了纳米结构的氮氧化钛（TiOxNy）薄膜。TiOxNy薄膜的形成机理取决于氧气和氮气的比例及其电离能。分别通过X射线衍射、X射线光电子能谱、场发射扫描电子显微镜和紫外-可见分光光度计研究了氮气和氧气对纳米结构TiOxNy薄膜的微观结构、形态和光学性质的影响。以 0.1 sccm 的 O2 流速沉积时形成结晶 TiOxNy 相，而以 0.2 – 0.4 sccm 的 O2 流速沉积时形成非晶 TiOxNy 相。此外，当 O2 流速高于 0.4 sccm 时，无定形 TiOxNy 相转变为二氧化钛相。纳米结构TiOxNy薄膜的横截面微观结构和表面形貌表现出较差的柱状结构和非常光滑的表面。当 O2 流速在 0.1 到 1.0 sccm 范围内时，TiOxNy 薄膜的光学带隙从 1.72 eV 增加到 3.41 eV。