Silicon (Si)-based solar cells have been widely used owing to their high conversion efficiency, high stability, and low cost. With the popularity of distributed photovoltaic systems, the appearance of photovoltaic panels has become more and more critical. However, compared to other types of solar cells, such as colored dye-sensitized and perovskite solar cells, the most widely used Si-based solar cells usually show a monotonous appearance. Here, we report the realization of high-resolution image patterned Si wafers by taking advantage of the inverted pyramid microstructure arrays. The digitized grayscale image is converted to the patterns that consist of inverted pyramid micro-structure units with different reflectivities. Then the patterns are transferred onto Si wafer through the processes of photolithography and dry/wet etching, enabling the construction of any grayscale image on the Si wafer with a resolution as high as 600 dots per inch (DPI) and a maximum contrast ratio of 4.7: 1. A laser ablation method, along with a circular pixel technology, is also developed to remarkably improve the patterning efficiency. Further, in combination with an optical anti-reflection layer, colored image patterned Si wafers are achieved. Our work demonstrates the enormous potential of image patterned Si solar cells for new-generation distributed solar energy systems with decorative features.

基于硅（Si）的太阳能电池由于其高转换效率，高稳定性和低成本而被广泛使用。随着分布式光伏系统的普及，光伏面板的外观变得越来越关键。但是，与其他类型的太阳能电池（如有色染料敏化和钙钛矿型太阳能电池）相比，使用最广泛的Si基太阳能电池通常显示出单调的外观。在这里，我们报告利用倒置的金字塔微结构阵列的优势实现高分辨率图像图案化的硅晶片。将数字化的灰度图像转换为由具有不同反射率的倒金字塔形微结构单元组成的图案。然后通过光刻和干/湿蚀刻工艺将图案转移到硅晶片上，可以在Si晶圆上构建任何灰度图像，分辨率高达600点/英寸（DPI），最大对比度为4.7：1。还开发了一种激光烧蚀方法以及一种圆形像素技术，以显着提高图案形成效率。此外，结合光学抗反射层，获得了彩色图像图案化的硅晶片。我们的工作证明了图像图案化的硅太阳能电池在具有装饰性特征的新一代分布式太阳能系统中的巨大潜力。结合光学抗反射层，可获得彩色图像图案化的硅晶片。我们的工作证明了图像图案化的硅太阳能电池在具有装饰性特征的新一代分布式太阳能系统中的巨大潜力。结合光学抗反射层，可获得彩色图像图案化的硅晶片。我们的工作证明了图像图案化的硅太阳能电池在具有装饰性特征的新一代分布式太阳能系统中的巨大潜力。