Study of the synthesis of C:H coating by PECVD for protecting Mg‐based nano‐objects,Plasma Processes and Polymers

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Study of the synthesis of C:H coating by PECVD for protecting Mg‐based nano‐objects
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2020-08-06 , DOI: 10.1002/ppap.202000083
Hui Liang _{1,

2} , Adriano Panepinto ₂ , Loic Prince ₃ , Marjorie Olivier _{3,

4} , Damien Cossement ₄ , Etienne Bousser ₅ , Xi Geng ₁ , Wenjiang Li _{1,

6} , Minfang Chen _{1,

6} , Rony Snyders _{2,

4} , Damien Thiry ₂

Affiliation

In the context of protecting Mg‐based nano‐objects for potential hydrogen storage applications, the potential of C:H layer as a barrier polymer material deposited by the plasma‐enhanced chemical vapor deposition process is examined. Corrosion tests reveal (a) good barrier properties of the C:H layer and (b) suggest an increase in the internal stress with the power dissipated in the plasma. The latter is attributed to an increase in the cross‐linking density of the coatings accompanied by an increase in the stiffness as shown by nanoindentation measurements. Finally, for a given set of plasma parameters, Mg‐based nanowires were successfully enrobed by the C:H coatings as evidenced by scanning electron microscopy measurements.

中文翻译：

PECVD合成C：H涂层保护镁基纳米物体的研究

在保护基于Mg的纳米物体用于潜在氢存储应用的情况下，研究了C：H层作为通过等离子体增强化学气相沉积工艺沉积的阻挡聚合物材料的潜力。腐蚀测试表明：（a）C：H层的良好阻隔性能，（b）表明随着应力在等离子体中的耗散，内部应力会增加。后者归因于涂层的交联密度的增加，同时硬度的增加，如纳米压痕测量所示。最后，对于给定的一组等离子体参数，C：H涂层成功覆盖了基于镁的纳米线，这是通过扫描电子显微镜测量证明的。

更新日期：2020-08-06

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