当前位置: X-MOL 学术ECS J. Solid State Sci. Technol. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Tunable Etching of CVD Graphene for Transfer Printing of Nanoparticles Driven by Desorption of Contaminants with Low Temperature Annealing
ECS Journal of Solid State Science and Technology ( IF 1.8 ) Pub Date : 2020-07-30 , DOI: 10.1149/2162-8777/aba855
L. S. Hui 1 , M. Munir 1 , E. Whiteway 2 , An. Vuong 2 , M. Hilke 2 , V. Wong 3 , G. Fanchini 3 , A. Turak 1
Affiliation  

Due to its exceptional mechanical properties, graphene can be an ideal support for nanotransfer printing. However, in its as-received state, it is incompatible with some processes for preparing 2D arrays of colloidal nanoparticles from reverse micelle templating. By treating CVD graphene with low temperature annealing, we have created a universal carrier to transfer such nanoparticles onto organic surfaces, taking advantage of the activation of the graphene surface via oxygen plasma etching. Desorption of hydrocarbon contaminant species by low temperature annealing is essential to ensure that exposure of the CVD graphene to the plasma oxidizes the film rather than etching it, as confirmed by Raman, Attenuated Total Reflectance- Fourier Transform Infrared (ATR-FTIR), and X-ray photoelectron spectroscopy measurements. Upon transfer printing to an organic surface, the nanoparticles are sandwiched between the reduced graphene oxide-like layer and the organic surface as shown by scan...

中文翻译:

CVD石墨烯的可调刻蚀,用于通过低温退火将污染物脱附驱动的纳米颗粒转移印刷

由于其卓越的机械性能,石墨烯可以成为纳米转移印刷的理想载体。然而,在其原样状态下,它与从反胶束模板制备胶体纳米颗粒的二维阵列的某些方法不兼容。通过使用低温退火处理CVD石墨烯,我们利用氧等离子体蚀刻激活的石墨烯表面,创造了一种通用载体,可将此类纳米颗粒转移到有机表面上。如拉曼,衰减全反射-傅立叶变换红外(ATR-FTIR)和X所证实的,通过低温退火解吸碳氢化合物污染物种类对于确保CVD石墨烯暴露于等离子体而不是对其进行蚀刻至关重要。射线光电子能谱测量。
更新日期:2020-07-31
down
wechat
bug