Postemergence grass weed control continues to be a big challenge in grain sorghum (Sorghum bicolor L. Moench), primarily due to a lack of herbicide options registered for use in this crop. The development of herbicide-resistant sorghum technology to facilitate broad-spectrum postemergence weed control is an economical and viable solution. The 4- hydroxyphenylpyruvate dioxygenase-inhibitor herbicides (e.g. mesotrione or tembotrione) can control broad-spectrum of weeds including grasses, which, however, is not registered for postemergence application in sorghum due to crop injury. In this study we identified two tembotrione-resistant sorghum genotypes (G-200, G-350) and one highly susceptible genotype (S-1) through screening 317 sorghum lines from the sorghum association panel (SAP). Compared to S-1, G-200 and G-350 exhibited 10- and 7-fold more resistance to tembotrione, respectively. Genetic analyses of the F1 and F2 progeny generated from a cross between tembotrione-resistant and -susceptible genotypes demonstrated that the resistance is a semi-dominant polygenic trait. Furthermore, cytochrome P450 (CYP)-inhibitor assay using malathion and piperonyl butoxide suggested possible CYP-mediated metabolism of tembotrione in G-200 and G-350. Genotype-by-sequencing based quantitative trait loci (QTL) mapping revealed eight QTLs associated with tembotrione resistance in grain sorghum. Sorghum genotypes G-200 and G-350 confer a high level of metabolic resistance to tembotrione and controlled by a polygenic trait. There is an enormous potential to introgress the tembotrione resistance into breeding lines to develop agronomically desirable sorghum hybrids.

中文翻译：

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对双色高粱中4-羟基苯基丙酮酸双加氧酶抑制剂替莫三酮的抗性

出苗后草杂草的控制仍然是谷物高粱（Sorghum bicolor L. Moench）的一大挑战，主要是由于缺乏用于该作物的除草剂选择。抗除草剂高粱技术的发展，以促进广谱芽后杂草控制是一种经济可行的解决方案。4-羟苯基丙酮酸双加氧酶抑制剂除草剂（例如甲基磺草酮或替康三酮）可以控制包括草在内的杂草的广谱性，但是由于农作物的伤害，它没有被注册用于高粱的芽后施用。在这项研究中，我们通过从高粱协会专家组（SAP）筛选了317份高粱系，鉴定了两种抗tembotrione的高粱基因型（G-200，G-350）和一种高度易感基因型（S-1）。与S-1相比，G-200和G-350分别对tembotrione的抵抗力提高了10倍和7倍。从抗替本三酮和易感基因型之间的杂交产生的F1和F2后代的遗传分析表明，抗性是半显性多基因性状。此外，使用马拉硫磷和胡椒基丁醚的细胞色素P450（CYP）抑制剂试验表明，在G-200和G-350中可能存在CYP介导的替勃三酮代谢。基于测序的基因型基于数量性状基因座（QTL）的映射揭示了八个QTL与谷物高粱中的替丁三酮抗性相关。高粱基因型G-200和G-350赋予替班曲酮高水平的代谢抗性，并受多基因性状控制。