Pt coatings on NiTi film micro-actuators and/or sensors can add some useful properties, e.g., they may improve the NiTi anticorrosion and thermomechanical characteristics or activate surface properties beneficial for a specific application (e.g., functionalized surfaces for biomedical applications). Pt coatings prepared via atomic layer deposition (ALD) may help reduce cost due to the nanometric thickness. However, no authors have reported preparation of Pt ALD coatings on NiTi films, perhaps due to the challenge of the concurrent NiTi film oxidation during the Pt ALD process. In the present study, Al₂O₃ and Pt ALD coatings were applied to NiTi thin films. The ALD coating properties were studied using electron and atomic force microscopies and X-ray photoelectron spectroscopy (XPS). Potential structural changes of NiTi due to the ALD process were evaluated using electron microscopy and X-ray diffraction. The presented ALD process resulted in well-controllable preparation of Pt nanoparticles on ultrathin Al₂O₃ seed layer and a change of the transformation temperatures of the NiTi films.

中文翻译：

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Ni2形状记忆膜表面改性的Al2O3和Pt原子层沉积

NiTi薄膜微执行器和/或传感器上的Pt涂层可以添加一些有用的特性，例如，它们可以改善NiTi的防腐性能和热机械特性，或者激活有益于特定应用的表面特性（例如，用于生物医学应用的功能化表面）。由于纳米厚度，通过原子层沉积（ALD）制备的Pt涂层可以帮助降低成本。但是，没有作者报告在NiTi膜上制备Pt ALD涂层，可能是由于在Pt ALD过程中同时发生NiTi膜氧化的挑战。在本研究中，Al ₂ O ₃将Pt ALD涂层应用于NiTi薄膜。使用电子和原子力显微镜和X射线光电子能谱（XPS）研究了ALD涂层的性能。使用电子显微镜和X射线衍射评估了由于ALD过程导致的NiTi潜在的结构变化。所提出的ALD工艺导致在超薄Al ₂ O ₃晶种层上可控的Pt纳米颗粒的制备以及NiTi膜的转变温度的变化。