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Design of Microstructure Parameters on a Small Multi-Throttle Aerostatic Guideway in Photolithography
Engineering ( IF 12.8 ) Pub Date : 2020-07-01 , DOI: 10.1016/j.eng.2019.09.012
Zhongpu Wen , Jianwei Wu , Kunpeng Xing , Yin Zhang , Jiean Li , Jiubin Tan

Abstract A compact multi-throttle aerostatic guideway is the preferred structure for high precision and acceleration motion in the variable-slit system (VS) of photolithography. The presence of microstructure, such as recesses and grooves, on the guideway working surface has been found to improve the loading performance. Nevertheless, the effects on the guideway performance of changing the microstructure on the micron level are not yet clear. The mesh adaptation method, which was proposed by the authors, is employed in this paper to quantitatively study the influences of four microstructure parameters. The effect of tuning these parameters on the loading performance is revealed. The level of impact determines the proposed design process of the parameters. The characteristic feature of the proposed design process is that the working points of carrying capacity, stiffness, and rotational stiffness are unified under two-way adjusting by means of recess parameters. According to the proposed design process and tuning method, the restriction of supply pressure is lifted to a certain extent and the mutual tradeoff among the loading performances is relieved. The experimental results show that the rotational stiffness of the designed guideway, based on the tuned parameters, reached 21.4 × 103 Nm·rad−1 and increased by 69.8%. In a scanning test of the applied VS on argon fluoride laser (ArF) photolithography, the average scanning acceleration reached 67.5 m·s−2, meeting the design specification.

中文翻译:

光刻中小型多节流空气静力导轨的显微结构参数设计

摘要 紧凑型多节流空气静力导轨是光刻可变狭缝系统(VS)高精度和加速度运动的首选结构。已经发现在导轨工作表面上存在微结构,例如凹槽和凹槽,可以提高负载性能。然而,在微米级改变微观结构对导轨性能的影响尚不清楚。本文采用作者提出的网格自适应方法定量研究了四种微结构参数的影响。揭示了调整这些参数对加载性能的影响。影响程度决定了建议的参数设计过程。所提出的设计过程的特点是承载能力、刚度和旋转刚度的工作点在通过凹槽参数的双向调整下统一。根据所提出的设计过程和调整方法,在一定程度上解除了供应压力的限制,缓解了负载性能之间的相互权衡。实验结果表明,基于调谐参数,设计的导轨的旋转刚度达到21.4×103 Nm·rad−1,增加了69.8%。应用VS在氟化氩激光(ArF)光刻扫描测试中,平均扫描加速度达到67.5 m·s-2,满足设计要求。根据所提出的设计过程和调整方法,在一定程度上解除了供应压力的限制,缓解了负载性能之间的相互权衡。实验结果表明,基于调谐参数,设计的导轨的旋转刚度达到21.4×103 Nm·rad−1,增加了69.8%。应用VS在氟化氩激光(ArF)光刻扫描测试中,平均扫描加速度达到67.5 m·s-2,满足设计要求。根据所提出的设计过程和调整方法,在一定程度上解除了供应压力的限制,缓解了负载性能之间的相互权衡。实验结果表明,在调整参数的基础上,设计的导轨转动刚度达到21.4×103 Nm·rad−1,增加了69.8%。应用VS在氟化氩激光(ArF)光刻扫描测试中,平均扫描加速度达到67.5 m·s-2,满足设计要求。4 × 103 Nm·rad−1 并增加了 69.8%。应用VS在氟化氩激光(ArF)光刻扫描测试中,平均扫描加速度达到67.5 m·s-2,满足设计要求。4 × 103 Nm·rad−1 并增加了 69.8%。应用VS在氟化氩激光(ArF)光刻扫描测试中,平均扫描加速度达到67.5 m·s-2,满足设计要求。
更新日期:2020-07-01
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