Abstract The paper presents a novel power supply device that provides a hybrid technique of dual magnetron sputtering. This power supply generates a sequence of bipolar pulses which provides both mid-frequency and high-power impulse magnetron sputtering. This allows using the advantages of both techniques, while numerous adjustable parameters considerably enhance the capabilities of the magnetron sputtering system. In the proposed power supply circuit, special attention is paid to the output pulse formers and the power switch control. The experimental results are obtained for superimposed mid-frequency and dual high-power impulse magnetron sputtering. During the aluminum film deposition, the deposition rate, the ion current density on the substrate and the ion-to-atom ratio are regulated by changing the power ratio between mid-frequency and high-power impulse magnetron sputtering.

中文翻译：

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用于双磁控溅射系统的混合 HIPIMS+MFMS 电源

摘要 本文提出了一种新型电源装置，它提供了一种双磁控溅射混合技术。该电源产生一系列双极脉冲，提供中频和高功率脉冲磁控管溅射。这允许使用这两种技术的优点，同时许多可调参数大大增强了磁控溅射系统的能力。在建议的电源电路中，特别注意输出脉冲发生器和电源开关控制。获得了叠加中频和双高功率脉冲磁控溅射的实验结果。在铝膜沉积过程中，沉积速率、