Nano-sized Ni–AlN thin films were prepared by pulse electrodeposition (PE) on A3 steel substrates. The microstructures, surface root-mean-square roughnesses, microhardness values, and corrosion performances of obtained nano-sized Ni–AlN thin films were investigated. Corrosion weight losses of Ni–AlN thin films were predicted by Backward propagation (BP) networks model. The results indicated that average diameters of Ni and AlN embedded in the films were evaluated to 57.9 and 29.2[Formula: see text]nm, respectively. Also, thin films were observed with uniform and compact surface structures, and Rq value was estimated to only 32.75[Formula: see text]nm.

中文翻译：

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脉冲电沉积纳米尺寸 Ni-AlN 薄膜：使用反向传播网络模型的制备和耐腐蚀性预测

通过脉冲电沉积 (PE) 在 A3 钢基材上制备纳米尺寸的 Ni-AlN 薄膜。研究了所得纳米Ni-AlN薄膜的微观结构、表面均方根粗糙度、显微硬度值和腐蚀性能。通过反向传播（BP）网络模型预测 Ni-AlN 薄膜的腐蚀失重。结果表明，嵌入薄膜中的Ni和AlN的平均直径分别为57.9和29.2[公式：见正文]nm。此外，还观察到薄膜具有均匀且致密的表面结构，估计Rq值仅为32.75[公式：见正文]nm。