The preparation of single‐phase and catalytically active GaPd2 coatings was accomplished via DC magnetron sputtering using an intermetallic sputter target. Thin and uniform layers were deposited on borosilicate glass, Si(111) and planar as well as micro‐structured stainless steel foils. The specimens were examined regarding their phase composition, film morphology and microstructure. Thin films of different layer thickness were catalytically characterized in the semi‐hydrogenation of acetylene, which was conducted at 473 K and a feed gas composition of 0.5 vol.% C2H2, 5 vol.% H2 as well as 50 vol.% C2H4 in helium. Pre‐reduction of the catalyst was found to be essential to enhance the catalytic selectivity. Sputtered GaPd2 showed a high selectivity of 73 % for the hydrogenation to ethylene at conversion levels above 80 %. The surface‐specific activity was strongly increased to 8.97 molacetylene· (A 0· h)–1 compared to bulk‐ or nanoscale GaPd2 (1.93 and 0.30 molacetylene· (A 0· h)–1, respectively) caused by the high specific surface area of the thin films.

中文翻译：

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用于乙炔选择性加氢的金属间化合物 GaPd2 薄膜

使用金属间溅射靶材通过直流磁控溅射制备单相和催化活性 GaPd2 涂层。薄而均匀的层沉积在硼硅玻璃、Si（111）和平面以及微结构不锈钢箔上。检查样品的相组成、膜形态和微观结构。在 473 K 和 0.5 vol.% C2H2、5 vol.% H2 和 50 vol.% C2H4 的氦气组成的乙炔半氢化中对不同层厚的薄膜进行催化表征. 发现催化剂的预还原对于提高催化选择性至关重要。溅射的 GaPd2 显示出 73% 的高选择性，用于在高于 80% 的转化率水平下氢化成乙烯。