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The Impact of ion-beam parameters on the characteristics of Nb2O5 thin films
Surfaces and Interfaces ( IF 5.7 ) Pub Date : 2020-09-01 , DOI: 10.1016/j.surfin.2020.100593
Hasan F. Khazaal , Ismail Sh Hburi , Mansour S. Farhan

Abstract In this study, the effects of ion-beam parameters on the mechanical, optical and inner structural characteristics of niobium pentoxide (Nb2O5) thin films is investigated. Where a vacuum coating system equipped with a gun of an electron beam at ambient substrate temperature is employed to precipitate Nb2O5 films onto substrates of dissolved silica glass via electron-beam supported by oxygen ions. It is found that the extinction coefficient, the crystalline phase, refractive index, and residual stress are heavily affected by current density and the energy of ion. The transformations in crystallinity, from amorphous to hexagonal transition, revealed in minimum residual stress of –455 *107 psi. The optical band gap and refractive index increased up to 0.96 and 2.32 respectively, as well as a very low extinction coefficient of 10−3 for precipitation at an ion energy of 0.8 KeV and 0.025 mA/cm2 current density.

中文翻译:

离子束参数对Nb2O5薄膜特性的影响

摘要 在这项研究中,研究了离子束参数对五氧化二铌 (Nb2O5) 薄膜的机械、光学和内部结构特性的影响。使用配备有电子束枪的真空镀膜系统在环境基板温度下通过氧离子支持的电子束将 Nb2O5 薄膜沉淀到溶解的石英玻璃基板上。发现消光系数、晶相、折射率和残余应力受电流密度和离子能量的影响很大。结晶度的转变,从无定形到六边形转变,显示最小残余应力为 –455 * 107 psi。光学带隙和折射率分别增加到 0.96 和 2.32,
更新日期:2020-09-01
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