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A non-oxidizing fabrication method for lithographic break junctions of sensitive metals
Nanoscale Advances ( IF 4.6 ) Pub Date : 2020-07-24 , DOI: 10.1039/d0na00498g
Anna Nyáry 1, 2 , Agnes Gubicza 1, 3 , Jan Overbeck 3, 4 , László Pósa 1, 5 , Péter Makk 1, 6 , Michel Calame 3, 4, 6 , András Halbritter 1, 2 , Miklós Csontos 1, 3
Affiliation  

Electrochemically active metals offer advanced functionalities with respect to the well-established gold electrode arrangements in various electronic transport experiments on atomic scale objects. Such functionalities can arise from stronger interactions with the leads which provide better coupling to specific molecules and may also facilitate metallic filament formation in atomic switches. However, the higher reactivity of the electrode metal also imposes challenges in the fabrication and reliability of nanometer scale platforms, limiting the number of reported applications. Here we present a high-yield lithographic fabrication procedure suitable to extend the experimental toolkit with mechanically controllable break junctions of oxygen sensitive metallic electrodes. We fabricate and characterize silver break junctions exhibiting single-atomic conductance and superior mechanical and electrical stability at room temperature. As a proof-of-principle application, we demonstrate resistive switching between metastable few-atom configurations at finite voltage bias.

中文翻译:

敏感金属光刻断裂结的非氧化制备方法

在原子尺度物体的各种电子传输实验中,电化学活性金属相对于成熟的金电极排列提供了先进的功能。这种功能可能源于与引线的更强相互作用,这提供了与特定分子更好的耦合,并且还可以促进原子开关中金属丝的形成。然而,电极金属的较高反应性也对纳米级平台的制造和可靠性提出了挑战,限制了报告的应用数量。在这里,我们提出了一种高产率的光刻制造程序,适用于扩展实验工具包,具有氧敏感金属电极的机械可控断裂结。我们制造并表征了银断裂结,其在室温下表现出单原子电导和卓越的机械和电稳定性。作为原理验证应用,我们展示了在有限偏压下亚稳态少原子配置之间的电阻切换。
更新日期:2020-09-16
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