The Halbach array magnetization of thick-film Nd–Fe–B magnets using local laser irradiation is examined. A 75 µm thick isotropic Nd–Fe–B magnet is deposited on a Si substrate by pulsed laser deposition and used to form microlinear Halbach arrays. The micromagnetization patterning of the Halbach arrays is realized by a combination of pulsed magnetization and laser-assisted heating with changing the external magnetic field direction. Halbach magnetic patterns with a pitch of 200 µm are obtained over a surface area of 1.7 mm width and 2.8 mm length. Their magnetic density over the top surface was measured by a scanning Hall probe. The vertical magnetic field value peak-to-peak at 100 µm from the magnet surface was 65 mT for the Halbach pattern, 2.7 times that of 24 mT for an alternating pattern.

中文翻译：

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厚膜 Nd-Fe-B 磁铁的微线性 Halbach 阵列利用局部激光照射和方向可变的外部磁场

研究了使用局部激光照射的厚膜 Nd-Fe-B 磁体的 Halbach 阵列磁化。通过脉冲激光沉积将 75 µm 厚的各向同性 Nd-Fe-B 磁体沉积在 Si 基板上，并用于形成微线性 Halbach 阵列。Halbach 阵列的微磁化图案是通过改变外部磁场方向的脉冲磁化和激光辅助加热的组合来实现的。在 1.7 mm 宽和 2.8 mm 长的表面积上获得了间距为 200 µm 的 Halbach 磁性图案。它们在顶面上的磁密度是通过扫描霍尔探头测量的。距磁铁表面 100 µm 处的垂直磁场值峰峰值对于 Halbach 图案为 65 mT，对于交替图案为 24 mT 的 2.7 倍。