Optical inspection of periodic nanostructures is a major challenge in semiconductor industry due to constantly decreasing critical dimensions. In this paper we combine Coherent Fourier Scatterometry (CFS) with a sectioning mask for subwavelength grating parameter determination. By selecting only the most sensitive regions of the scattered light in the Fourier plane, this tool helps to retrieve grating parameters faster than previous approaches. Moreover, the full process of coherent Fourier scatterometry by using focused light is explained and implemented in subwavelength regime. The results of using transverse magnetic polarized input fields together with the proposed sectioning mask are presented and compared to the non-mask case.

中文翻译：

---

使用相干傅立叶散射测量法检索亚波长光栅参数的远场切片

由于关键尺寸不断减小，周期性纳米结构的光学检测是半导体行业的主要挑战。在本文中，我们将相干傅立叶散射测量 (CFS) 与切片掩模相结合，用于确定亚波长光栅参数。通过仅选择傅立叶平面中散射光的最敏感区域，该工具有助于比以前的方法更快地检索光栅参数。此外，在亚波长范围内解释和实施了使用聚焦光的相干傅里叶散射测量的完整过程。介绍了使用横向磁极化输入场和建议的切片掩模的结果，并与非掩模情况进行了比较。