In this study, nuclear radiation shielding features of Al₂Si₂O₅(OH)₄–KAlSi₃O₈–SiO₂ ceramic systems were explored by depending on cobalt (Co) insertion ratio (0, 5, 10, 20, 30 wt%). For this aim, five ceramic samples were produced and their elemental compositions were obtained with SEM-EDX analysis. Then, transmission measurements were achieved by using an ultra Ge detector and photons with 0.081–0.383 keV energy ranges. From the evaluated transmission spectra, mass attenuation coefficient (μ_ρ) values of five ceramics were obtained experimentally and compared with theoretical results. According to the outcomes, the increment of the Co insertion rises the μ_ρ values, whereas the half-value layer (HVL) value declines. It is also observed that effective atomic number (Z_eff) values are raised, while effective electron density (N_el) is declined as Co additive increases in the ceramic sample. The geometric progression (GP) approach was utilized to estimate the energy absorption buildup factor (EABF) and exposure buildup factor (EBF) for the produced ceramic samples. EABFs and EBFs were obtained to be the smallest for 30% doped S5 sample according to the other ceramic samples. Lastly, the neutron attenuation ability of the ceramic samples was interpreted by finding the effective neutron cross sections (Σ_R). It is noticed that the Σ_R values are almost similar for all of the ceramics. As a result, the S5 sample is a skilled nominee for photon and neutron protection applications among the fabricated ceramic samples.

Graphical abstract

在这项研究中，根据钴（Co）的插入比（0、5、10、20、30、0、5、10、20、30 ）探索了Al ₂ Si ₂ O ₅（OH）₄ -KAlSi ₃ O ₈ -SiO ₂陶瓷体系的核辐射屏蔽特性。wt％）。为此，生产了五个陶瓷样品，并通过SEM-EDX分析获得了其元素组成。然后，通过使用Ultra Ge检测器和能量范围为0.081–0.383 keV的光子实现传输测量。从评价透射光谱，质量衰减系数（μ _ρ通过实验获得了五种陶瓷的值，并将其与理论结果进行了比较。根据结果，将Co插入增量上升到μ _ρ值，而半值层（HVL）的值下降。还观察到有效原子序数（Z _eff）值提高了，而有效电子密度（N _el随陶瓷样品中Co添加剂含量的增加而下降。几何级数（GP）方法用于估算所生产陶瓷样品的能量吸收累积系数（EABF）和暴露累积系数（EBF）。根据其他陶瓷样品，对于30％掺杂的S5样品，EABF和EBF最小。最后，陶瓷样品的中子衰减能力通过寻找有效的中子截面（Σ解释_{- [R} ）。值得注意的是，Σ _[R值是所有陶瓷几乎相同。结果，S5样品在制造的陶瓷样品中成为光子和中子保护应用领域的熟练候选人。

图形概要