Diamond-like carbon (DLC) films were grown on Si substrates by high-density helicon wave plasma (HWP) generated under low pressure, with the help of CH4 as an important single-source precursor. The influence of magnetic field (B0: 1200-2400 Gs) on the film structure, morphology, composition, and mechanical properties has been studied. The high deposition rate of the films exhibits a maximum of 800 nm/min, which is contributed by the high-density plasma generation of HWP. By the X-ray photoelectron spectroscopy (XPS) analysis, the as-deposited DLC film is composed mainly of sp2 C-C. The DLC film deposited at B0 = 2400 Gs exhibits that the friction coefficient reaches its minimum value of 5 × 10-3, with small surface roughness (root mean square (RMS) ~ 10 nm). Considering that B0 can be easily controlled, this article opens up a new approach to achieve ultralow friction coefficient DLC films with a high deposited rate at room temperature.

中文翻译：

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磁场对高密度螺旋波等离子体制备类金刚石碳薄膜性能的影响


借助 CH4 作为重要的单源前驱体，通过低压下产生的高密度螺旋波等离子体 (HWP) 在硅衬底上生长类金刚石碳 (DLC) 薄膜。研究了磁场（B0：1200-2400 Gs）对薄膜结构、形貌、成分和力学性能的影响。薄膜的高沉积速率最高可达 800 nm/min，这得益于 HWP 的高密度等离子体产生。通过X射线光电子能谱(XPS)分析，沉积态DLC薄膜主要由sp2 CC组成。 B0 = 2400 Gs 沉积的 DLC 薄膜表现出摩擦系数达到最小值 5 × 10-3，表面粗糙度较小（均方根（RMS）~ 10 nm）。考虑到B0易于控制，本文开辟了一种在室温下以高沉积速率实现超低摩擦系数DLC薄膜的新方法。