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Time-resolved formation of uranium and silicon oxides subsequent to the laser ablation of U3Si2
Spectrochimica Acta Part B: Atomic Spectroscopy ( IF 3.2 ) Pub Date : 2020-08-01 , DOI: 10.1016/j.sab.2020.105925
Emily N. Weerakkody , David G. Weisz , Jonathan Crowhurst , Batikan Koroglu , Timothy Rose , Harry Radousky , Ryan L. Stillwell , Jason R. Jeffries , Nick G. Glumac

Abstract The early-time kinetic behavior of species in a plume produced from laser ablation of U3Si2 in an environment containing 2% O2 is characterized using time-resolved absorption spectroscopy. The UO band around 593.55 nm and the SiO band around 230 nm is observed as well as various atomic and ionic uranium transitions. Temperatures and concentrations of these species are tracked and reported as well.

中文翻译:

U3Si2 激光烧蚀后铀和氧化硅的时间分辨形成

摘要 使用时间分辨吸收光谱法表征在含 2% O2 环境中 U3Si2 激光烧蚀产生的羽流中物质的早期动力学行为。观察到 593.55 nm 附近的 UO 带和 230 nm 附近的 SiO 带以及各种原子和离子铀跃迁。这些物种的温度和浓度也被跟踪和报告。
更新日期:2020-08-01
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