Abstract

Using the methods of optically stimulated electron emission (OSEE) and ambient pressure photoemission spectroscopy (APS), the energy characteristics of carbyne-containing films on copper and silicon substrates have been studied. The average contact potential difference and the work function were determined, and the positions of the Fermi level for carbyne-containing films of various thicknesses were calculated. It was found that the electrons work function and the position of the Fermi level of the studied film samples do not depend on the film thickness and the type of substrate. The information content of the OSEE and APS methods for evaluating the quality of carbon coatings on substrates is shown.

中文翻译：

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碳纳米复合薄膜在真空和常压下的电子功函数

摘要

使用光激发电子发射（OSEE）和环境压力光发射光谱（APS）的方法，研究了铜和硅衬底上含碳炔薄膜的能量特性。确定平均接触电势差和功函数，并计算各种厚度的含碳炔薄膜的费米能级的位置。发现所研究的膜样品的电子功函数和费米能级的位置不取决于膜厚度和衬底的类型。显示了用于评估基材上碳涂层质量的OSEE和APS方法的信息内容。