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Assessment of atomic layer deposited TiO2photocatalytic self-cleaning by quartz crystal microbalance
Journal of Vacuum Science & Technology A ( IF 2.4 ) Pub Date : 2020-06-02 , DOI: 10.1116/6.0000198
Théo Henry 1 , Paolo Martins 2 , Etienne Eustache 2 , Bernard Servet 2 , Laurent Divay 2 , Pierre Jouanne 3 , Philippe Grasset 3 , Jean-Paul Dudon 3 , Patrick Hugonnot 3 , Karl Fleury-Frenette 1
Affiliation  

The self-cleaning properties emerging from photocatalytic effects consist in the elimination of an organic contamination layer by light-induced redox reactions. Quartz crystal microbalances (QCMs), monitoring the contaminant mass loss under UV illumination, were used to investigate this effect and its efficiency. A new setup dedicated to such purpose is introduced along with the results of a self-cleaning experiment performed with a 20-nm TiO2 thin film coated on a QCM by atomic layer deposition. In particular, a 10-nm paraffin oil thin film deposited under vacuum is shown to be degraded down to its complete removal according to a zeroth order photocatalytic reaction. Finally, the experimental opportunities offered by the new setup, such as a controlled environment composition, are presented.

中文翻译:

石英晶体微量天平评估原子层沉积的TiO2光催化自洁

由光催化作用产生的自清洁性能包括通过光诱导的氧化还原反应消除有机污染物层。石英晶体微天平(QCM)用于监测紫外线照射下的污染物质量损失,用于研究这种影响及其效率。引入了专用于此目的的新设置以及通过原子层沉积在QCM上涂覆的20 nm TiO 2薄膜进行的自清洁实验的结果。尤其是,根据零级光催化反应,在真空下沉积的10 nm石蜡油薄膜显示降解至完全去除。最后,介绍了新设置提供的实验机会,例如受控环境组成。
更新日期:2020-07-09
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