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High-contrast optical microscopy of graphene sheets.
Microscopy Research and Technique ( IF 2.0 ) Pub Date : 2020-07-08 , DOI: 10.1002/jemt.23505
Mohammad Reza Rashidian Vaziri 1
Affiliation  

In the way of making graphene an industry‐friendly material, it must be mass‐produced with high‐quality and reduced cost over large areas. Assisted by machine‐learning techniques, rapid, nondestructive and accurate determination of large graphene sheets on SiO2/Si substrates has been made possible in recent years by the optical microscopy method. Optimization of the substrate to achieve the maximum contrast can further extend the application of the optical microscopy method for quality control of the mass‐produced graphene. Graphene/n2/n3three‐layer structures, where n2 and n3 are refractive indices, are routinely used for identifying the number of graphene layers by optical reflection microscopy. In this paper, two analytical equations are derived that can be easily used for high‐contrast optical imaging of graphene sheets without any need to resort to the cumbersome numerical methods. One of the equations is derived for choosing the best material with refractive index n2 that when coated on a substrate with refractive index n3, maximizes the optical contrast. The other equation is derived for finding the best thickness of the SiO2 layer in graphene/SiO2/Si structures, which are in common use for fabrication of graphene‐based devices. The results are implemented in a MATLAB GUI, see Supporting Information, to assist the users in using the equations.

中文翻译:

石墨烯片的高对比度光学显微镜。

在使石墨烯成为行业友好型材料的过程中,必须在大面积上高质量,低成本地大量生产石墨烯。近年来,借助机器学习技术,通过光学显微镜方法,可以快速,无损且准确地确定SiO 2 / Si基片上的大型石墨烯片。为实现最大对比度而对基板进行的优化可以进一步扩展光学显微镜方法在批量生产石墨烯质量控制方面的应用。石墨烯/ n 2 / n 3三层结构,其中n 2n 3是折射率,通常用于通过光学反射显微镜识别石墨烯层的数量。本文推导了两个解析方程式,它们可以轻松地用于石墨烯片的高对比度光学成像,而无需诉诸繁琐的数值方法。导出方程式之一,以选择折射率为n 2的最佳材料,当该材料涂覆在折射率为n 3的基板上时,光学对比度最大。导出另一个方程,以找到石墨烯/ SiO 2中的最佳SiO 2层厚度/ Si结构,通常用于制造基于石墨烯的器件。结果在MATLAB GUI中实现,请参阅支持信息,以帮助用户使用方程式。
更新日期:2020-07-08
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