Abstract In this article, chemical-vapor-deposition-(CVD)-based pristine carbon nanowall (PCNW) was modified in oxygen plasma and a hydrothermal reduction system into oxidized carbon nanowall (OCNW) and reduced oxidized carbon nanowall (rOCNW). The solubility behavior of the functional groups formed on the PCNW, OCNW, and rOCNW surfaces in ketone- and alcohol-type organic solvents was demonstrated and investigated. When the surfaces of the samples reacted with acetone and methanol were magnified, OCNW showed very high solubility. This indicated that most of the functional groups existed on the surface of OCNW, and that these functional groups reacted the most with the organic solvents, forming H bonding. The dispersion analysis confirmed that the solubility was induced by the activity in the functional groups bonded with the molecules of acetone and methanol. The X-ray photoelectron spectra showed clear changes in hydroxyl and carbonyl, suggesting that hydroxyl and carbonyl are key groups. The ID/IG ratio in the Raman spectra after the reaction with the organic solvents slightly increased. Local dissociation is expected after absorption by the organic solvents into the weak points where the carbon branches were removed by the oxygen plasma. As in the experiment, the prepared CNW reacted with the organic solvents, which showed different results from the carbon-based materials.

中文翻译：

---

有机溶剂改性无催化剂碳纳米壁的溶解性

摘要 在本文中，基于化学气相沉积 (CVD) 的原始碳纳米壁 (PCNW) 在氧等离子体和水热还原系统中被改性为氧化碳纳米壁 (OCNW) 和还原氧化碳纳米壁 (rOCNW)。证明并研究了在 PCNW、OCNW 和 rOCNW 表面上形成的官能团在酮类和醇类有机溶剂中的溶解行为。当样品与丙酮和甲醇反应的表面被放大时，OCNW 显示出非常高的溶解度。这表明大多数官能团存在于 OCNW 表面，这些官能团与有机溶剂反应最多，形成 H 键。分散分析证实溶解度是由与丙酮和甲醇分子键合的官能团的活性引起的。X射线光电子能谱显示出羟基和羰基的明显变化，表明羟基和羰基是关键基团。与有机溶剂反应后，拉曼光谱中的 ID/IG 比率略有增加。在被有机溶剂吸收到碳支链被氧等离子体去除的薄弱点之后，预计会发生局部解离。在实验中，制备的 CNW 与有机溶剂反应，显示出与碳基材料不同的结果。与有机溶剂反应后，拉曼光谱中的 ID/IG 比率略有增加。在被有机溶剂吸收到碳支链被氧等离子体去除的薄弱点之后，预计会发生局部解离。在实验中，制备的 CNW 与有机溶剂反应，显示出与碳基材料不同的结果。与有机溶剂反应后，拉曼光谱中的 ID/IG 比率略有增加。在被有机溶剂吸收到碳支链被氧等离子体去除的薄弱点之后，预计会发生局部解离。在实验中，制备的 CNW 与有机溶剂反应，显示出与碳基材料不同的结果。