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Copper removal kinetic from electroplating industry wastewater using pulsed electrodeposition technique
Environmental Technology ( IF 2.2 ) Pub Date : 2020-07-16 , DOI: 10.1080/09593330.2020.1793005
Thayane Carpanedo de Morais Nepel 1 , Josiel Martins Costa 1 , Melissa Gurgel Adeodato Vieira 1 , Ambrósio Florêncio de Almeida Neto 1
Affiliation  

ABSTRACT

This study presents a kinetic determination of copper removal from a real jewelry industry wastewater, with removal reaching 82.49% at 37°C, using fast galvanic pulse electrochemical technique in a process lasting 115 min. In the temperature range from 20 to 40°C, the mathematical model of the pseudo-first-order irreversible rate equation, with a correlation coefficient of 0.99, described the process behaviour. In this same temperature range, the Arrhenius’ equation described the system, in which the temperature increase favoured the reaction kinetics. The scanning electron microscope (SEM), with energy-dispersive X-ray detector (EDX), X-ray photoelectron spectroscopy (XPS) results, and the mathematical model fitting at the temperatures of 10 and 50°C indicated the formation of copper oxide I.



中文翻译:

采用脉冲电沉积技术从电镀工业废水中去除铜的动力学

摘要

本研究介绍了使用快速电流脉冲电化学技术在持续 115 分钟的过程中从真正的珠宝行业废水中去除铜的动力学测定,在 37°C 时去除率达到 82.49%。在 20 至 40°C 的温度范围内,相关系数为 0.99 的伪一级不可逆速率方程的数学模型描述了过程行为。在同一温度范围内,Arrhenius 方程描述了系统,其中温度升高有利于反应动力学。具有能量色散 X 射线检测器 (EDX) 的扫描电子显微镜 (SEM)、X 射线光电子能谱 (XPS) 结果以及在 10 和 50°C 温度下拟合的数学模型表明形成了氧化铜一世。

更新日期:2020-07-16
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