High refractive index (HRI, n > 1.8) photonic structures offer strong light confinement and refractive efficiencies, cover the entire visible spectrum and can be tuned by designing geometric arrayed features. However, its practical applications are still hindered by the applicability and material limitation of lithography-based micro/nano fabrication approaches. Herein, we demonstrate a fluid-guided printing process for preparing HRI selenium microarrays. The microstructured flexible template is replicated from the diced silicon wafer without any lithography-based methods. When heated above the glass transition temperature, the flow characteristics of selenium endows the structure downsizing and orientation patterning between the target substrate and the template. Near 10 times narrowing selenium microarrays (1.9 μm width) are patterned from the non-lithography template (18 μm width). HRI selenium microarrays offer high refractive efficiencies and strong optical confinement abilities, which achieve angle-dependent structurally coloration and polarization. Meanwhile, the color difference can be recognized under the one degree distinction of the angle between incident and refracted light. This printing platform will facilitate HRI optical metasurfaces in a variety of applications, ranging from photonic sensor, polarization modulation to light manipulation.

高折射率（HRI，n > 1.8) 光子结构提供强大的光限制和折射效率，覆盖整个可见光谱，可以通过设计几何阵列特征进行调整。然而，其实际应用仍然受到基于光刻的微/纳米制造方法的适用性和材料限制的阻碍。在此，我们演示了用于制备 HRI 硒微阵列的流体引导印刷工艺。微结构柔性模板是从切割的硅晶片复制而来的，无需任何基于光刻的方法。当加热到玻璃化转变温度以上时，硒的流动特性赋予目标基板和模板之间的结构缩小和取向图案化。将近 10 倍缩小的硒微阵列 (1. 9 μm 宽度）从非光刻模板（18 μm 宽度）图案化。HRI 硒微阵列具有高折射效率和强大的光学限制能力，可实现角度相关的结构着色和偏振。同时，可以在入射光和折射光之间的角度的一度区分下识别色差。该印刷平台将促进各种应用中的 HRI 光学超表面，从光子传感器、偏振调制到光操纵。在入射光和折射光的夹角差一度的情况下就可以辨别出色差。该印刷平台将促进各种应用中的 HRI 光学超表面，从光子传感器、偏振调制到光操纵。在入射光和折射光的夹角差一度的情况下就可以辨别出色差。该印刷平台将促进各种应用中的 HRI 光学超表面，从光子传感器、偏振调制到光操纵。