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Formation of Zn Films by Magnetron Sputtering on Glass, Quartz and Silicon Substrates
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques Pub Date : 2020-07-07 , DOI: 10.1134/s1027451020030118
V. A. Polishchuk , V. V. Tomaev , N. B. Leonov

Abstract

Using magnetron sputtering, Zn films are obtained on glass, quartz and silicon substrates. The morphology of the surface is investigated by scanning electron microscopy. The sizes and statistical parameters of Zn nanocrystals are determined. It is established that the morphology of the surface of zinc films greatly depends both on the technological-application conditions and on the substrate material. With the help of the theory of homogeneous and heterogeneous formation of nuclei of a new phase, the geometric and thermodynamic parameters of structural elements of the investigated films are estimated. The possibility of controlling the degree of twinning in hexagonal zinc nanocrystals is discussed. The peculiarity of the formation of a new phase is the double structure of hexagonal Zn nanocrystals. By selecting the deposition parameters, one can obtain a Zn film with the orientation of the plane of nanocrystals [0001] parallel to the plane of the substrate.


中文翻译:

磁控溅射在玻璃,石英和硅基板上形成锌膜

摘要

使用磁控溅射,可以在玻璃,石英和硅基板上获得Zn膜。通过扫描电子显微镜研究表面的形态。确定了Zn纳米晶体的尺寸和统计参数。已经确定,锌膜表面的形态在很大程度上取决于技术应用条件和基底材料。借助于新相的均相和非均相形成理论,估算了被研究薄膜的结构元素的几何和热力学参数。讨论了控制六角形锌纳米晶体中孪晶度的可能性。形成新相的独特之处在于六角形Zn纳米晶体的双重结构。通过选择沉积参数,
更新日期:2020-07-07
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