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Formation of Zn Films by Magnetron Sputtering on Glass, Quartz and Silicon Substrates
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques Pub Date : 2020-07-07 , DOI: 10.1134/s1027451020030118 V. A. Polishchuk , V. V. Tomaev , N. B. Leonov
中文翻译:
磁控溅射在玻璃,石英和硅基板上形成锌膜
更新日期:2020-07-07
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques Pub Date : 2020-07-07 , DOI: 10.1134/s1027451020030118 V. A. Polishchuk , V. V. Tomaev , N. B. Leonov
Abstract
Using magnetron sputtering, Zn films are obtained on glass, quartz and silicon substrates. The morphology of the surface is investigated by scanning electron microscopy. The sizes and statistical parameters of Zn nanocrystals are determined. It is established that the morphology of the surface of zinc films greatly depends both on the technological-application conditions and on the substrate material. With the help of the theory of homogeneous and heterogeneous formation of nuclei of a new phase, the geometric and thermodynamic parameters of structural elements of the investigated films are estimated. The possibility of controlling the degree of twinning in hexagonal zinc nanocrystals is discussed. The peculiarity of the formation of a new phase is the double structure of hexagonal Zn nanocrystals. By selecting the deposition parameters, one can obtain a Zn film with the orientation of the plane of nanocrystals [0001] parallel to the plane of the substrate.中文翻译:
磁控溅射在玻璃,石英和硅基板上形成锌膜