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The structural, optical, and morphological properties of NiO‐Cu prepared by spray pyrolysis technique
Microwave and Optical Technology Letters ( IF 1.0 ) Pub Date : 2020-07-06 , DOI: 10.1002/mop.32500
Haidar J. Mohamad 1 , Yahyah Mustafa Abdul‐Husaain 2 , Uday Ali Sabeeh Al‐Jarah 3
Affiliation  

The technique of spray pyrolysis used to prepare the pure thin films NiO and NiO:Cu. In this study, the nickel chloride salt solution (NiCl2⋅6H2O) was used to fabricate thin films deposited on a glass substrate. The structural, optical, and morphological fabricated properties of the samples were investigated. X‐ray diffraction reveals a polycrystalline nickel oxide layer with a crystalline cubic form, with (111), (200), and (222). Atomic force microscopic studied the surface morphology of the thin‐film samples. The fabrication process of growth was at the specific doping ratio (0%, 0.5%, 1%, 1.5%, and 2%) where all thin films had a cubic structure. The energy difference for the NiO and NiO:Cu reference samples have ranged from 3.25 to 3.5 eV. The mobility, magnetoresistance, resistivity, and conductivity were measured and presented as well as the relationship between current‐voltage and current‐resistivity.

中文翻译:

喷雾热解技术制备的NiO-Cu的结构,光学和形态学性质

喷雾热解技术用于制备纯薄膜NiO和NiO:Cu。在这项研究中,氯化镍盐溶液(的NiCl 2 ⋅6H 2O)用于制造沉积在玻璃基板上的薄膜。研究了样品的结构,光学和形态加工特性。X射线衍射显示具有结晶立方晶形的多晶氧化镍层,具有(111),(200)和(222)。原子力显微镜研究了薄膜样品的表面形态。生长的制造过程是在特定的掺杂率(0%,0.5%,1%,1.5%和2%)下,其中所有薄膜都具有立方结构。NiO和NiO:Cu参考样品的能量差范围为3.25至3.5 eV。测量并给出了迁移率,磁阻,电阻率和电导率,以及电流-电压和电流-电阻率之间的关系。
更新日期:2020-07-06
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