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Structural and optical properties of Zn1−x−yAlx SiyO wurtzite heterostructure thin film for photovoltaic applications
Materials Science and Engineering: B ( IF 3.9 ) Pub Date : 2020-07-06 , DOI: 10.1016/j.mseb.2020.114614
A. Abbassi , Fatimazahra Nainaa , Mestapha Arejdal , Mihaela Toma , Aumeur El Amrani , Hamid Ez-Zahraouy , Felicia Iacomi

The study aims to investigate the optical and structural properties of ZnO wurtzite heterostructure thin films in order to manufacture them as a new generation of solar cell transparent electrodes. With the Sol gel- spin coating process, the pure and co-doped Zinc oxide with different amounts of aluminum and silicon were prepared. The composition was realized in order to obtain thin films with Al + Si contents in the range of 0 at% to 6 at%. XRD patterns exhibit the ZnO wurtzite structure. XPS analysis sustain the presence of Al3+and Si3+ in Zn lattice sites. The optical investigations showed that the band gap varies between 3.23 eV and 3.28 eV, showing an increase with increasing the silicon amount. The studied thin films present a significant transmittance parameter in particular the with films having 2 at% of Si and 2% of Al with higher average value which reached 95%.



中文翻译:

用于光伏应用的Zn 1-x-y Al x Si y O纤锌矿异质结构薄膜的结构和光学性质

该研究旨在研究ZnO纤锌矿异质结构薄膜的光学和结构特性,以将其制造为新一代的太阳能电池透明电极。通过Sol凝胶旋涂工艺,制备了纯铝和共掺杂的铝和硅含量不同的氧化锌。实现组成是为了获得Al + Si含量在0at%至6at%范围内的薄膜。XRD图谱显示ZnO纤锌矿结构。XPS分析支持Al 3+和Si 3+的存在在锌晶格位。光学研究表明,带隙在3.23 eV和3.28 eV之间变化,表明随着硅含量的增加而增加。所研究的薄膜特别是具有2at%的Si和2%的Al的薄膜具有显着的透射率参数,具有更高的平均值,达到95%。

更新日期:2020-07-06
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