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Chitosan modified silicon dioxide composites for the capture of graphene oxide
Journal of Physics and Chemistry of Solids ( IF 4.3 ) Pub Date : 2020-12-01 , DOI: 10.1016/j.jpcs.2020.109629
Jian Wang , Ran Ma , Pengcheng Gu

Abstract Graphene oxide (GO) is considered as a toxic carbon material, and the adverse impact of GO has been realized. Herein, the spherical chitosan modified silicon dioxide (CS/SiO2) was prepared to eliminate GO. Considering the effects of hydroxyl and amidogen groups, the introduction of chitosan onto silicon dioxide can not only change the morphology and size of the composite but also increase the removal capacity for GO. The experimental results demonstrated that the removal of GO onto the CS/SiO2 composites relied on pH and ionic strength. The maximum removal capacity of CS/SiO2 for GO was 111.8 mg/g, and the elimination of GO was endothermic. Based on the characterization analysis, the electrostatic attraction played the main role in GO removal process. Furthermore, the hydroxyl groups and amidogen groups on the surface of CS/SiO2 formed a hydrogen bond with GO, which was conducive to GO capture. This work promoted the trapping of GO and provided an example for other nanomaterials removal from the aquatic environment.

中文翻译:

壳聚糖改性二氧化硅复合材料用于捕获氧化石墨烯

摘要 氧化石墨烯(GO)被认为是一种有毒的碳材料,GO 的不利影响已经被认识到。在此,制备球形壳聚糖改性二氧化硅 (CS/SiO2) 以消除 GO。考虑到羟基和氨基的影响,在二氧化硅上引入壳聚糖不仅可以改变复合材料的形貌和尺寸,还可以提高对GO的去除能力。实验结果表明,在 CS/SiO2 复合材料上去除 GO 依赖于 pH 值和离子强度。CS/SiO2对GO的最大去除量为111.8mg/g,GO的去除是吸热的。基于表征分析,静电引力在GO去除过程中起主要作用。此外,CS/SiO2 表面的羟基和酰胺基团与 GO 形成氢键,有利于 GO 的捕获。这项工作促进了 GO 的捕获,并为从水生环境中去除其他纳米材料提供了一个例子。
更新日期:2020-12-01
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