In this study, boron nitride (BN) and its composites with nickel oxide (NiO) have been deposited on glass substrates. Structural, morphological as well as temperature-dependent electrical properties of BN-based nanocomposite films have been investigated. The structural analysis confirmed the phase formation of BN and NiO. X-ray diffraction analysis inferred the presence of defect states in deposited films which may affect the electrical properties. Results revealed that the conductivity of deposited films depends upon composite composition and temperature. A charge transport mechanism for deposited films has been proposed for a better understanding of the transport process. This study provides the insights of temperature dependency of electrical conductivity of deposited films.

在这项研究中，氮化硼（BN）及其与氧化镍（NiO）的复合物已沉积在玻璃基板上。已经研究了基于BN的纳米复合薄膜的结构，形貌以及与温度有关的电学性质。结构分析证实了BN和NiO的相形成。X射线衍射分析推断出沉积膜中存在缺陷状态，这可能会影响电性能。结果表明，沉积膜的电导率取决于复合材料的成分和温度。为了更好地理解传输过程，已经提出了用于沉积膜的电荷传输机制。这项研究提供了对沉积膜电导率的温度依赖性的见解。