Nanoimprinting of Refractive Index: Patterning Subwavelength Effective Media for Flat Optics,ACS Applied Nano Materials

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Nanoimprinting of Refractive Index: Patterning Subwavelength Effective Media for Flat Optics
ACS Applied Nano Materials ( IF 5.3 ) Pub Date : 2020-07-02 , DOI: 10.1021/acsanm.0c01395
Tahmid H. Talukdar ₁ , Julius C. Perez ₂ , Judson D. Ryckman ₁

Affiliation

Subwavelength effective media offer a powerful tool for tailoring optical properties on the surface of a chip but remain challenging to realize at optical frequencies owing to their demand for nanoscale features. To meet this challenge, a simple two-step method for patterning refractive index on the surface of a chip is introduced. The process is referred to as “nanoimprinting of refractive index” (NIRI) and relies on the direct nanoimprinting and plastic deformation of high-porosity mesoporous silicon thin films. This is shown to enable very wide and patternable tuning of refractive index over a range Δn ≈ 1 RIU. Investigation of the effective medium response to film compression reveals close agreement to effective medium theory only after factoring in the contribution from the nanoscaled native oxide. NIRI opens a new route for harnessing the subwavelength degree of freedom and offers the prospect of realizing high-performance and low-cost flat optics.

中文翻译：

折射率的纳米压印：图案化用于平板光学的亚波长有效介质

亚波长有效介质提供了一种强大的工具，可用于调整芯片表面的光学特性，但由于其对纳米级特征的需求，因此在光频率下实现仍然存在挑战。为了解决这一挑战，引入了一种简单的两步法来在芯片表面构图折射率。该过程称为“折射率纳米压印”（NIRI），它依赖于高孔隙度介孔硅薄膜的直接纳米压印和塑性变形。这表明可以在Δn范围内非常宽且可图案化地调整折射率≈1 RIU。仅在考虑了纳米级天然氧化物的贡献后，对膜压缩的有效介质响应的研究显示出与有效介质理论的紧密一致性。NIRI开辟了一条利用亚波长自由度的新途径，并为实现高性能和低成本平面光学提供了前景。

更新日期：2020-08-28

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