Abstract TiO2 thin films were deposited by the energy filtrating magnetron sputtering (EFMS) technique and the traditional direct current magnetron sputtering (DMS) technique. The influence of the filtering electrode mesh number on the structure and optical properties of TiO2 thin films was investigated. The structure, surface morphology and optical properties were characterized by XRD, SEM and ellipsometric spectroscopy, respectively. Results show that the TiO2 thin films deposited by the DMS and EFMS techniques at the same deposition parameters are composed of the anatase phase exclusively. TiO2 thin films deposited at lower deposition rate by the EFMS technique have lower crystallinity, smaller particle size and smoother surface. With increasing the mesh number, the refractive index, extinction coefficient and optical band gap are larger.

中文翻译：

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过滤电极对能量过滤磁控溅射技术制备的TiO2薄膜结构和光学性能影响的研究

摘要 采用能量过滤磁控溅射（EFMS）技术和传统的直流磁控溅射（DMS）技术制备了TiO2薄膜。研究了过滤电极网数对TiO2薄膜结构和光学性能的影响。分别通过XRD、SEM和椭偏光谱对其结构、表面形貌和光学性质进行了表征。结果表明，在相同沉积参数下，通过 DMS 和 EFMS 技术沉积的 TiO2 薄膜仅由锐钛矿相组成。通过 EFMS 技术以较低沉积速率沉积的 TiO2 薄膜具有较低的结晶度、较小的粒径和更光滑的表面。随着网格数的增加，折射率、消光系数和光学带隙都变大。