Carbon beam writing was employed as a method for maskless production of microscale capacitors in both insulating graphene oxide (GO) and poly(methyl methacrylate) (PMMA) matrix. The GO and PMMA foils were irradiated using a 5‐MeV C³⁺ beam with micrometer scale resolution. As follows, the shape of the created microstructures and compositional changes was studied using the scanning electron microscopy/energy‐dispersive X‐ray spectroscopy method (SEM/EDS). The structural and compositional progression was characterized by Raman spectroscopy, Rutherford backscattering spectroscopy (RBS), and elastic recoil detection analysis (ERDA) spectroscopy. The improvement of the prepared structures' electrical properties was also studied, and it can be concluded that carbon irradiation leads to the removal of oxygen and hydrogen and to growth of the carbon domains, which is connected with the conductivity increase of the irradiated parts and capacitance of the final products in the order of pF.

中文翻译：

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离子束刻写制备的GO和聚合物微电容器的比较

碳束写入被用作在绝缘氧化石墨烯（GO）和聚甲基丙烯酸甲酯（PMMA）基质中无掩模生产微型电容器的方法。使用5-MeV C ³⁺辐照GO和PMMA箔千分尺刻度分辨率的光束。如下，使用扫描电子显微镜/能量色散X射线光谱法（SEM / EDS）研究了产生的微观结构的形状和成分变化。通过拉曼光谱，卢瑟福背散射光谱（RBS）和弹性反冲检测分析（ERDA）光谱对结构和成分进行了表征。还研究了所制备结构的电性能的改善，可以得出结论，碳辐照导致氧和氢的去除以及碳畴的生长，这与被辐照部分的电导率的增加和电容的增加有关。最终产品的数量按pF顺序排列。