当前位置: X-MOL 学术Surf. Coat. Technol. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Study of columnar growth, texture development and wettability of reactively sputter-deposited TiN, ZrN and HfN thin films at glancing angle incidence
Surface & Coatings Technology ( IF 5.3 ) Pub Date : 2020-06-30 , DOI: 10.1016/j.surfcoat.2020.126130
Rubenson Mareus , Cédric Mastail , Fırat Anğay , Noël Brunetière , Gregory Abadias

In this work, TiN, ZrN and HfN thin films fabricated using glancing angle deposition (GLAD) technique are studied both experimentally and by numerical simulations. The films (~1 μm thickness) were deposited by reactive magnetron sputtering at 0.3 Pa and 300 °C on Si substrates inclined at α = 85° with respect to the target. The film morphology and crystal structure were characterized by scanning electron microscopy, atomic force microscopy and X-ray diffraction (XRD), including pole figure measurements. The wettability of these coatings was investigated using the sessile drop method with three different liquids. It is shown that TiN, ZrN and HfN films have a cubic, NaCl-type crystal structure with a [111] out-of-plane orientation and exhibit a biaxial texture. XRD pole figures reveal that the crystal habit of the grains consists of {100} facets constituting triangular-base pyramids. The films develop columnar microstructures, with typical column widths of ~100 nm. The tilt angle β of the columns is found to increase from 24.5, 31.5 to 34° for TiN, ZrN and HfN films, respectively. Atomistic computations of the growth of these nitrides at glancing angle using a kinetic Monte Carlo model reveal that the growth morphology and variation in column tilt angle is well reproduced by considering the difference in the angular distribution of the sputtered particles. This study also shows that GLAD films are hydrophilic comparatively to the same films deposited at near-normal incidence, and among the three nitrides, TiN is the more wettable coating.



中文翻译:

反应掠角沉积TiN,ZrN和HfN薄膜的柱状生长,织构发展和润湿性的研究

在这项工作中,对通过掠角沉积(GLAD)技术制备的TiN,ZrN和HfN薄膜进行了实验和数值模拟研究。通过在0.3 Pa和300°C的反应磁控溅射在相对于目标倾斜α= 85°的Si衬底上沉积薄膜(〜1μm厚)。通过扫描电子显微镜,原子力显微镜和X射线衍射(XRD)(包括极图测量)来表征薄膜的形态和晶体结构。使用无溶剂滴落法在三种不同的液体中研究了这些涂料的润湿性。结果表明,TiN,ZrN和HfN膜具有立方的NaCl型晶体结构,其面外取向为[111],并显示出双轴织构。XRD极图显示,晶粒的晶体习性由构成三角形底棱锥的{100}面组成。薄膜会形成柱状微结构,典型的柱宽约为100 nm。对于TiN,ZrN和HfN膜,发现柱的倾斜角β从24.5、31.5分别增加到34°。使用动力学蒙特卡洛模型对这些氮化物在掠射角处的生长进行原子计算,结果表明,考虑到溅射粒子角度分布的差异,可以很好地再现生长形态和柱倾斜角的变化。这项研究还表明,与在接近法线入射的情况下沉积的相同膜相比,GLAD膜具有亲水性,并且在三种氮化物中,TiN是更易润湿的涂层。薄膜会形成柱状微结构,典型的柱宽约为100 nm。对于TiN,ZrN和HfN膜,发现柱的倾斜角β从24.5、31.5分别增加到34°。使用动力学蒙特卡洛模型对这些氮化物在掠射角处的生长进行原子计算,结果表明,考虑到溅射粒子角度分布的差异,可以很好地再现生长形态和柱倾斜角的变化。这项研究还表明,与在接近法线入射的情况下沉积的相同膜相比,GLAD膜具有亲水性,并且在三种氮化物中,TiN是更易润湿的涂层。薄膜会形成柱状微结构,典型的柱宽约为100 nm。对于TiN,ZrN和HfN膜,发现柱的倾斜角β从24.5、31.5分别增加到34°。使用动力学蒙特卡洛模型对这些氮化物在掠射角处的生长进行原子计算,结果表明,考虑到溅射粒子角度分布的差异,可以很好地再现生长形态和柱倾斜角的变化。这项研究还表明,与在接近法线入射的情况下沉积的相同膜相比,GLAD膜具有亲水性,并且在三种氮化物中,TiN是更易润湿的涂层。使用动力学蒙特卡洛模型对这些氮化物在掠射角处的生长进行原子计算,结果表明,考虑到溅射粒子角度分布的差异,可以很好地再现生长形态和柱倾斜角的变化。这项研究还表明,与在接近法线入射的情况下沉积的相同膜相比,GLAD膜具有亲水性,并且在三种氮化物中,TiN是更易润湿的涂层。使用动力学蒙特卡洛模型对这些氮化物在掠射角处的生长进行原子计算,结果表明,考虑到溅射粒子角度分布的差异,可以很好地再现生长形态和柱倾斜角的变化。这项研究还表明,与在接近法线入射的情况下沉积的相同膜相比,GLAD膜具有亲水性,并且在三种氮化物中,TiN是更易润湿的涂层。

更新日期:2020-06-30
down
wechat
bug