The present study investigates the structural and optical properties under thermal annealing for gallium phthalocyanine chloride film (GaPcCl). The annealing does not have any effect on the stability of the chemical structure of GaPcCl films but has a noticeable effect on the optical properties such as the refractive index $n$, extinction coefficient $k$, optical conductivity (${\sigma }_1^{*}$ ${\sigma }_2^{*}$) and the complex dielectric constant (${\epsilon }_1$ ${\epsilon }_2)$. The urbach energy and optical are estimated at different thermal annealing for GaPcCl films. The values of the optical moments M_-1, M_-3 are calculated and found to be increase with thermal annealing at estimated temperatures for GaPcCl films. On the other hand, the third order of the non-linear susceptibility ${\chi }^{(3)}$ and the non-linear refractive index n₂, are calculated and found to be increase with thermal annealing. Thus, the annealing can be utilized as a tool to modify the optical properties of GaPcCl films.

本研究调查了热退火过程中的镓酞菁氯化镓薄膜（GaPcCl）的结构和光学性质。退火对GaPcCl薄膜的化学结构稳定性没有任何影响，但对光学性能（如折射率）有显着影响$ñ$，消光系数 $ķ$，光导率（${\sigma }_{\mathrm{1个}}^{*}$ ${\sigma }_2^{*}$）和复介电常数（${\epsilon }_{\mathrm{1个}}$ ${\epsilon }_2）$。对于GaPcCl薄膜，在不同的热退火条件下估算了urbach能量和光能。计算了光学矩M _-1，M _-3的值，发现它们在GaPcCl薄膜的估计温度下随热退火而增加。另一方面，非线性磁化率的三阶${\chi }^{（3）}$计算出非线性折射率n ₂和非线性折射率n ₂随着热退火而增加。因此，可以将退火用作改变GaPcCl膜的光学性质的工具。