当前位置: X-MOL 学术Micro Nanostruct. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Combined effect of Cu and N on bandgap modification of ZnO film towards effective visible light responsive photocatalytic dye degradation
Micro and Nanostructures ( IF 2.7 ) Pub Date : 2020-09-01 , DOI: 10.1016/j.spmi.2020.106637
D.S. Vasanthi , K. Ravichandran , P. Kavitha , S. Sriram , P.K. Praseetha

Abstract This article focuses on the deposition of ZnO, ZnO:N, ZnO:Cu and ZnO:Cu:N thin films using nebulizer spray technique towards the decomposition of textile dyes through photocatalysis. The observed individual optimum doping concentrations of Cu (0.5 wt %) and N (3 wt %) were chosen for the preparation of co-doped films. As doping partners of ZnO, Cu and N result in better outcome when they are used together as co-dopants rather than used individually. The band gap values were found to be decreased from 3.39 (undoped ZnO) to 3.17, 2.94 and 2.58 after N, Cu and Cu:N doping, respectively as observed from the optical study. The dopant induced band gap modifications estimated for the samples using optical transmittance data are correlated with the enhancement in the photocatalytic dye degrading efficiency. Results obtained from XRD, SEM, optical and XPS studies are correlated suitably with the photocatalysis results. The mechanism behind the enhancement of degrading efficiency has been discussed in this paper with the support of structural, compositional, optical and surface morphological analyses.

中文翻译:

Cu和N对ZnO薄膜带隙改性对有效可见光响应光催化染料降解的综合影响

摘要 本文重点研究了使用雾化器喷雾技术沉积 ZnO、ZnO:N、ZnO:Cu 和 ZnO:Cu:N 薄膜以通过光催化分解纺织染料。选择观察到的单个最佳掺杂浓度 Cu (0.5 wt%) 和 N (3 wt%) 来制备共掺杂薄膜。作为 ZnO 的掺杂伙伴,Cu 和 N 一起用作共掺杂剂而不是单独使用时会产生更好的结果。从光学研究中观察到,在 N、Cu 和 Cu:N 掺杂后,带隙值分别从 3.39(未掺杂的 ZnO)降低到 3.17、2.94 和 2.58。使用光学透射率数据为样品估计的掺杂剂引起的带隙修改与光催化染料降解效率的增强相关。从 XRD、SEM、光学和 XPS 研究与光催化结果相关。在结构、成分、光学和表面形态分析的支持下,本文讨论了提高降解效率背后的机制。
更新日期:2020-09-01
down
wechat
bug