Abstract In this work, for the first time, the effect of changing Ag thickness on the optical and electrical properties of SnO2/Ag/SnO2 tri-layered films prepared by magnetron sputtering equipped with glancing angle deposition has been investigated. Several parameters such as figure of merit (FOM), sheet resistance, NIR emissivity, and refractive index have been studied for the structure prepared by the different thickness of Ag. It has been found that the sample with thickness of 100 and 25 nm, respectively, for the SnO2 and the Ag layers has the maximum FOM of 44.37 × 10−4 Ω−1, the sheet resistance of 7.53 Ω/sq, average transmittance of 71.18% and NIR emissivity of 0.093 which shows the remarkable impact of the glancing angle deposition technique on the optical and electrical parameters of these structures.

中文翻译：

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通过改变银厚度来调整 SnO2/Ag/SnO2 三层的光学特性

摘要 在这项工作中，首次研究了改变Ag 厚度对通过配备掠射角沉积的磁控溅射制备的SnO2/Ag/SnO2 三层薄膜的光学和电学性能的影响。已经针对由不同厚度的 Ag 制备的结构研究了几个参数，例如品质因数 (FOM)、薄层电阻、NIR 发射率和折射率。已经发现，对于 SnO2 和 Ag 层，厚度分别为 100 和 25 nm 的样品具有 44.37 × 10−4 Ω−1 的最大 FOM，7.53 Ω/sq 的薄层电阻，平均透射率为71.18% 和 0.093 的 NIR 发射率显示了掠射角沉积技术对这些结构的光学和电学参数的显着影响。