Surface terminations of diamond play an important role in determining the electric properties of diamond-based electronic devices. We report an ultraviolet/ozone (UV/ozone) treatment process on hydrogen-terminated single crystal diamond (H-diamond) to modulate the carrier behavior related to varying oxygen adsorption on surfaces. By UV/ozone treatments, the induced oxygen radicals are chemically adsorbed on the H-terminated diamond and replace the original adsorbed H, which is analyzed by x-ray photoelectron spectroscopy. The concentration of oxygen adsorbed on surface increases from ~3% to ~8% with increasing the ozone treatment time from 20 s to 600 s. It is further confirmed by examining the wettability properties of the varying diamond surfaces, where the hydrophobic for H-termination transfers to hydrophilic for partly O-termination. Hall effect measurements show that the resistance (hole mobility) of the UV/ozone-treated H-diamond continuously increases (decrease) by t...

中文翻译：

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紫外/臭氧处理氢封端单晶金刚石的表面氧吸附和电性能

金刚石的表面端接在确定基于金刚石的电子设备的电性能方面起着重要作用。我们报告了氢封端的单晶金刚石（H-钻石）的紫外线/臭氧（UV /臭氧）处理工艺，以调节与改变表面上的氧吸附有关的载体行为。通过紫外线/臭氧处理，诱导的氧自由基化学吸附在氢封端的金刚石上，并取代了最初吸附的氢，后者通过X射线光电子能谱进行了分析。随着臭氧处理时间从20 s增加到600 s，吸附在表面上的氧气浓度从〜3％增加到〜8％。通过检查变化的金刚石表面的润湿性进一步证实了这一点，其中用于H端基的疏水性转移到用于部分O端基的亲水性。