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Evaluating mechanical properties of 100nm-thick atomic layer deposited Al2O3 as a free-standing film
Scripta Materialia ( IF 5.3 ) Pub Date : 2020-10-01 , DOI: 10.1016/j.scriptamat.2020.06.028
Junmo Koo , Sangmin Lee , Junmo Kim , Dong Hwan Kim , Byoung-Ho Choi , Taek-Soo Kim , Joon Hyung Shim

Abstract Due to the reduced thickness of thin films formed via atomic layer deposition, analyzing their true mechanical properties is difficult. To overcome this drawback, tensile tests on free-standing alumina thin films floating on water were conducted to measure their mechanical properties. Tensile tests on alumina thin films formed at different deposition temperatures were also conducted; the results indicated that higher Young's modulus and the strength were obtained from thin films formed at higher deposition temperatures. Factors responsible for the variations in mechanical properties were investigated through analyses of the structure, density, and composition of the films.

中文翻译:

评估 100 纳米厚的原子层沉积的 Al2O3 作为独立薄膜的机械性能

摘要 由于通过原子层沉积形成的薄膜厚度减小,很难分析其真实的机械性能。为了克服这个缺点,对漂浮在水面上的自支撑氧化铝薄膜进行了拉伸试验,以测量它们的机械性能。还对不同沉积温度下形成的氧化铝薄膜进行了拉伸试验;结果表明,在较高沉积温度下形成的薄膜可获得较高的杨氏模量和强度。通过分析薄膜的结构、密度和成分,研究了导致机械性能变化的因素。
更新日期:2020-10-01
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