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Impact of The Crystal Phase of ZrO2 on Charge Trapping Memtransistor as Synaptic Device for Neural Network Application
IEEE Journal of the Electron Devices Society ( IF 2.0 ) Pub Date : 2020-01-01 , DOI: 10.1109/jeds.2020.2993859
Yu-Che Chou , Chien-Wei Tsai , Chin-Ya Yi , Wan-Hsuan Chung , Chao-Hsin Chien

In this work, we investigated the effects of the crystal phase of ZrO2 on charge trapping memtransistors (CTMTs) as synaptic devices for neural network applications. The ZrO2 deposited through thermal (t-ZrO2) atomic layer deposition (ALD) and plasma (p-ZrO2) ALD were analyzed using an X-ray diffractometer, which indicated that the t-ZrO2 consisted of pure cubic phase, whereas p-ZrO2 consisted of both cubic and tetragonal phases. Through X-ray photoelectron spectroscopy analysis, we then constructed the energy band diagram of the gate stacks. The $\Delta \mathrm E_{C}$ of t- and p-ZrO2 with respect to tunneling and blocking Al2O3 were 1.84 and 1.19 eV respectively. Because of the relatively large $\Delta \text{E}_{\mathrm{ C}}$ of t-ZrO2, the window of the flat band voltage ( $\text{V}_{\mathrm{ FB}}$ ) shift extracted from charge trapping capacitors was enlarged by 591.9 mV more than the one using p-ZrO2 as the charge trapping layer. Retention was also improved by 10.4% after $10^{5}$ s in the t-ZrO2 case. Finally, we fabricated the CTMTs with the gate stack of the t-ZrO2 case and demonstrated their characteristics as synaptic devices. With the optimization of pulse schemes, we reduced the nonlinear factors of depression ( ${\alpha } _{\mathrm{ d}}$ ) and potentiation ( ${\alpha } _{\mathrm{ p}}$ ) from −6.72 and 6.47 to 0.03 and 0.01 respectively, enlarged the ON/OFF ratio from 15.6 to 70.4 and increased the recognition accuracy from 27.6% to 86.5% simultaneously.

中文翻译:

ZrO2 晶相对作为神经网络应用突触器件的电荷捕获忆阻器的影响

在这项工作中,我们研究了 ZrO 2的晶相对作为神经网络应用的突触器件的电荷俘获记忆晶体管 (CTMT) 的影响。所述的ZrO 2通过热(叔的ZrO沉积2)原子层沉积(ALD)和等离子体(P-的ZrO 2使用X射线衍射仪,这表明T-的ZrO)ALD进行分析2由纯立方相,而p-ZrO 2由立方相和四方相组成。通过X射线光电子能谱分析,我们构建了栅叠层的能带图。这 $\Delta \mathrm E_{C}$ t-和p-ZrO 2 的隧穿和阻挡Al 2 O 3分别为1.84和1.19 eV。由于相对较大 $\Delta \text{E}_{\mathrm{ C}}$ t-ZrO 2的平带电压窗口 ( $\text{V}_{\mathrm{ FB}}$ ) 从电荷俘获电容器中提取的偏移比使用 p-ZrO 2作为电荷俘获层的偏移扩大了 591.9 mV 。留存率也提高了 10.4% $10^{5}$ s 在 t-ZrO 2情况下。最后,我们制造了具有 t-ZrO 2情况下的栅极堆叠的 CTMT,并展示了它们作为突触器件的特性。随着脉冲方案的优化,我们减少了抑郁症的非线性因素( ${\alpha } _{\mathrm{ d}}$ ) 和增强 ( ${\alpha } _{\mathrm{ p}}$ ) 分别从-6.72 和 6.47 增加到 0.03 和 0.01,同时将 ON/OFF 比从 15.6 扩大到 70.4,并将识别准确率从 27.6% 提高到 86.5%。
更新日期:2020-01-01
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