Abstract Very thin N-doped nanostructured carbon films were deposited on quartz and sapphire substrate by radio-frequency reactive magnetron sputtering using carbon target and gas mixture of Ar and N2 or N2+H2 reactive gasses. Rutherford backscattering spectroscopy and Elastic recoil detection analytical methods determined the concentration of elements in the films. Scanning electron microscopy was used to investigate the surface morphology of nanostructured very thin carbon films. Raman spectroscopy was used for the determination of chemical structural properties of the thin nanostructured carbon films. Pulsed laser induced electron emission method was used for the study of photoelectron emission properties of nanostructured carbon films. Measured bunch charge results of fabricated transmission photocathodes showed better photoelectron emission properties of very thin nanostructured carbon films prepared on sapphire substrates. Effects of substrate and technology of very thin nanostructured carbon films on the properties of photo-induced electron emitters as backside illuminated transmission photocathode are discussed.

中文翻译：

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石英和蓝宝石衬底上的非常薄的 N 掺杂纳米结构碳膜：光电子发射特性

摘要 使用碳靶和 Ar 和 N2 或 N2+H2 反应气体的气体混合物，通过射频反应磁控溅射在石英和蓝宝石衬底上沉积非常薄的 N 掺杂纳米结构碳膜。卢瑟福背散射光谱和弹性反冲检测分析方法确定了薄膜中元素的浓度。扫描电子显微镜用于研究纳米结构的非常薄的碳膜的表面形态。拉曼光谱用于测定薄纳米结构碳膜的化学结构特性。脉冲激光诱导电子发射方法用于研究纳米结构碳膜的光电子发射特性。制造的透射光电阴极的束电荷测量结果表明，在蓝宝石衬底上制备的非常薄的纳米结构碳膜具有更好的光电子发射特性。讨论了非常薄的纳米结构碳膜的衬底和技术对作为背照式透射光电阴极的光致电子发射器性能的影响。