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The state of coating–substrate interfacial region formed during TiO2 coating deposition by Gas Injection Magnetron Sputtering technique
Surface & Coatings Technology ( IF 5.3 ) Pub Date : 2020-06-22 , DOI: 10.1016/j.surfcoat.2020.126092
Rafal Chodun , Katarzyna Nowakowska-Langier , Bartosz Wicher , Sebastian Okrasa , Roch Kwiatkowski , Dobromil Zaloga , Marlena Dypa , Krzysztof Zdunek

This manuscript presents the nature of interaction of energetic plasmoids, generated in the Gas Injection Magnetron Sputtering (GIMS) technique, with the surface of substrate or the coating–substrate system. We expected that the plasma generated by a dynamic injection of gas (GIMS) is better ionized than the plasma generated in stationary pressure in its standard range for magnetron sputtering. The GIMS technique operates under conditions that may favor the plasma species to retain their kinetic energy, limiting the probability of intermolecular collisions events. In this experiment, the frequency of injecting small amounts of gas was used as a parameter to control the pressure amplitudes, thus achieving the conditions of plasma generation from stationary, through quasi-stationary, to pulsed oscillations of pressure. The optical emission spectroscopy (OES) was used to evaluate the state of deposition environment in GIMS. Investigation showed that the plasma spectrum consists of higher population of ions in the conditions of high amplitude of pressure oscillations. The phase content of a titanium dioxide coating, deposited under various conditions of plasma generation, also depends on the energetic state of plasma. Raman spectroscopy proved that the stationary condition favors the anatase phase as the nucleation phase, while with the increase in the non-equilibrium of plasma, the metastable rutile phase is more expected. The effects of strong impingement of energetic species were observed, causing crystallization of the amorphous phase of coatings, with sputtering of the substrate surface and the formation of a specific type of coating–substrate interfacial region.



中文翻译:

气体注入磁控溅射技术在TiO 2涂层沉积过程中形成的涂层-基底界面区域状态

该手稿介绍了用气体注入磁控溅射技术(GIMS)产生的高能等离子体与基材表面或涂层-基材系统相互作用的性质。我们期望通过动态注入气体(GIMS)产生的等离子体比在固定压力下在其磁控管溅射的标准范围内产生的等离子体更好地电离。GIMS技术在可能有利于等离子体物质保留其动能的条件下运行,从而限制了分子间碰撞事件的可能性。在该实验中,注入少量气体的频率被用作控制压力幅度的参数,从而实现了从固定,准静态到压力脉冲振荡的等离子体生成条件。光学发射光谱法(OES)用于评估GIMS中沉积环境的状态。研究表明,在压力振荡幅度较大的情况下,等离子体光谱由较高的离子组成。在各种等离子体产生条件下沉积的二氧化钛涂层的相含量还取决于等离子体的高能态。拉曼光谱法证明,稳定条件有利于锐钛矿相作为成核相,而随着血浆非平衡度的增加,亚稳态金红石相被期待。观察到强冲击高能物种的影响,导致涂层非晶相的结晶,

更新日期:2020-06-22
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